Nanoscale EELS analysis of elemental distribution and band-gap properties in AlGaN epitaxial layers

Nanoscale EELS analysis of elemental distribution and band-gap properties in AlGaN epitaxial layers
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AlGaN 外延层中元素分布和带隙特性的纳米级 EELS 分析

DOI:
10.1088/1742-6596/326/1/012039
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发表时间:
2011
期刊:
Conference Series
影响因子:
--
通讯作者:
Amari H
Amari H
中科院分区:
--
文献类型:
--
作者:
Amari H

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氮化铝镓(AlGaN)是高功率和高温电子器件以及短波(可见和紫外)光电器件的有力候选材料。对于氮化层的带隙工程,能够对其光学特性进行精确的局部测量是至关重要的。本文采用核损失电子能谱(EELS)、等离子体能谱(plas激元能谱)和价态能谱(VEELS)研究了AlGaN的局部化学性质和带隙。
Aluminium gallium nitride (AlGaN) is a strong candidate for high-power and high-temperature electronic devices and short-wavelength (visible and ultraviolet) optoelectronic devices. For band-gap engineering of nitride layers, it is essential to be able to perform an accurate local measurement of their optical properties. In this work, core-loss electron energy loss spectroscopy (EELS), plasmon spectroscopy and valence EELS (VEELS) are compared for the investigation of the local chemistry and band-gap of AlGaN.
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影响因子: 4
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