Novel cubic phase III-nitride complementary metal-oxide-semiconductor transistor technology

Novel cubic phase III-nitride complementary metal-oxide-semiconductor transistor technology
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新型立方相III氮化物互补金属氧化物半导体晶体管技术

DOI:
10.1117/12.2286738
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发表时间:
2018
期刊:
Quantum Sensing and Nano Electronics and Photonics XV
影响因子:
--
通讯作者:
Park, Kihoon
Park, Kihoon
中科院分区:
--
文献类型:
--
作者:
Bayram, Can;Grady, Ryan;Park, Kihoon

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在这里,我们提出了一个新的宽带隙逻辑电路提供新兴的电力电子与可靠的逻辑控制能力与500 MHz+的开关速度和承受300 V+。具体地,模拟了由NMOS(μe= 1000 cm 2/V-s)和PMOS(μh= 250 cm 2/V-s)立方相GaN器件(分别为0.77 V和-0.84 V)组成的三级环形振荡器。通过优化NMOS和PMOS器件之间的宽长比(W/L)来最小化传播延迟。瞬态响应的模拟说明了CMOS反相器的能力,以1.22 GHz的最高频率与VDD的2.5 V和0 V之间的全电压摆幅工作。解决了电力电子领域最长期存在的问题之一,并构成了创新的基础,降低了总生命周期成本,是下一代集成、可扩展和可靠的电力系统的基石。
Here we propose a new wide band gap logic circuitry providing emerging power electronics with reliable logic control capabilities with 500 MHz+ switching speeds and withstanding 300V+. Particularly, a three-stage ring oscillator composed of NMOS (μe= 1000 cm2/V-s) and PMOS (μh= 250 cm2/V-s) cubic phase GaN devices (with VTof 0.77 V and –0.84 V, respectively) is simulated. The propagation delay is minimized by optimizing the width-to-length ratio (W/L) between the NMOS and PMOS devices. Transient response of the simulation illustrates the ability of the CMOS inverter to operate at a maximum frequency of 1.22 GHz with a full voltage swing between VDDof 2.5 V and 0 V. The proposed cutting-edge p-channel GaN high hole mobility transistor (HHMT) solves one of the most longstanding problems in power electronics and constitutes the basis of an innovative reduced total life cycle cost that will serve as the cornerstone of the next generation of integrated, scalable, and reliable power systems.
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影响因子: --
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