DC and RF sputtered molybdenum electrodes for Cu(In,Ga)Se2 thin film solar cells
DC and RF sputtered molybdenum electrodes for Cu(In,Ga)Se2 thin film solar cells
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用于 Cu(In,Ga)Se-2 薄膜太阳能电池的直流和射频溅射钼电极
DOI:
10.1016/j.apsusc.2018.09.130
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发表时间:
2019-01
影响因子:
6.7
通讯作者:
Wan M.
中科院分区:
文献类型:
--
作者:
Zhu H.;Dong Z.;Niu X.;Li J.;Shen K.;Mai Y.;Wan M.
In this study, molybdenum (Mo) thin films are deposited at different working pressures and different target-substrate distances (Dt-s) (8 cm and 10 cm) under the excitation of the radio frequency (RF) or direct current (DC) power supply for applications in Cu(In,Ga)Se2(CIGS) thin film solar cells. The various material properties including dynamic deposition rate, electrical and optical properties, crystal structure and morphology are systematically investigated and compared for these RF and DC sputtered Mo thin films. Mo bilayer, i.e. bottom Mo layer prepared at a high working pressure and top Mo thin film sputtered at a low working pressure are employed as back electrodes in CIGS thin film solar cells. CIGS thin film solar cells with DC Mo/DC Mo bilayer have relatively higher efficiency as compared to the others with RF Mo layers, which might be related to a relatively easy migration of sodium (Na) passing through the DC Mo layers and entering into the CIGS absorbers. A high efficiency CIGS thin film solar cell of 16.2% has been achieved in this work.
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DOI:
10.1002/pssa.201700132
发表时间:
2017-06
期刊:
physica status solidi (a)
影响因子:
--
作者:
Niu Xiaona;Zhu Hongbing;Zhang Wen;Liang Xiaoyang;Guo Yuting;Li Zhiqiang;Chen Jinwei;Xu Ying;Mai Yaohua
通讯作者:
Mai Yaohua
DOI:
10.1116/1.581583
发表时间:
1999-01
期刊:
Journal of Vacuum Science and Technology
影响因子:
--
作者:
D. Niles;M. Al‐Jassim;K. Ramanathan
通讯作者:
D. Niles;M. Al‐Jassim;K. Ramanathan
影响因子:
3.2
作者:
V. Lyahovitskaya;Y. Feldman;K. Gartsman;H. Cohen;C. Cytermann;D. Cahen
通讯作者:
V. Lyahovitskaya;Y. Feldman;K. Gartsman;H. Cohen;C. Cytermann;D. Cahen
DOI:
10.1116/1.581408
发表时间:
1998-07
期刊:
Journal of Vacuum Science and Technology
影响因子:
--
作者:
T. Drüsedau;M. Löhmann;B. Garke
通讯作者:
T. Drüsedau;M. Löhmann;B. Garke
影响因子:
6.9
作者:
J. Yoon;Sunghun Cho;W. Kim;Jong Keuk Park;Y. Baik;T. Lee;T. Seong;J. Jeong
通讯作者:
J. Yoon;Sunghun Cho;W. Kim;Jong Keuk Park;Y. Baik;T. Lee;T. Seong;J. Jeong