Friction and wear behaviors of molybdenum disulfide nanosheets under normal electric field

Friction and wear behaviors of molybdenum disulfide nanosheets under normal electric field
复制标题

二硫化钼纳米片在正常电场下的摩擦磨损行为

DOI:
10.1016/j.apsusc.2018.05.221
复制
发表时间:
2018-10
影响因子:
6.7
通讯作者:
Guoxin Xie
Guoxin Xie
中科院分区:
材料科学1区
文献类型:
--
作者:
Yuanming Zeng;Feng He;Quan Wang;Xiaohong Yan;Guoxin Xie

文献摘要

参考文献

被引文献

相似文献

利用原子力显微镜(AFM)研究了微二硫化钼(MoS2)的摩擦磨损行为,并对导电探针和基体施加正负偏压。实验结果表明,外加法向电场可以调节MoS2纳米片与AFM探针之间的纳米摩擦力.摩擦力随外加偏压的增大而增大。最大偏差具有阈值。当偏压超过阈值时,会促进MoS2电荷转移的形成,加速摩擦过程中的氧化。与无偏置条件下的摩擦力相比,摩擦力的调谐值可提高2倍。提出了一种可行的、有价值的调节MoS2体系摩擦特性的策略,对实际应用中理解和控制纳米摩擦具有重要意义。
The friction and wear behavior of micro-molybdenum disulfide (MoS2) is studied by atomic force microscope (AFM), and both positive and negative bias are applied to the conductive probe and substrate. The experimental results show that the nano-friction between MoS2nano-sheets and AFM probes can be regulated by an external normal electric field. Friction force will increase with the increase of the external bias. The maximum bias has a threshold value. If the bias exceeds the threshold, it will promote the formation of MoS2charge transfer and accelerate oxidation during the friction process. The tuning value of the friction force can be increased by 2 times, compared with the friction force under the condition of non-bias. We propose a feasible and valuable strategy to adjust the friction characteristics of the MoS2system, which provides great significance to understand and control the nano-friction in the practical application.
DOI: 10.1016/j.mee.2006.10.059
发表时间: 2007-03-01
影响因子: 2.3
作者:
Bhushan, Bharat
通讯作者: Bhushan, Bharat
DOI: 10.1063/1.1584082
发表时间: 2003-07-01
影响因子: 1.6
作者:
Varenberg, M;Etsion, I;Halperin, G
通讯作者: Halperin, G
DOI: 10.1016/s1748-0132(07)70140-8
发表时间: 2007-10-01
期刊: NANO TODAY
影响因子: 17.4
作者:
Kim, Seong H.;Asay, David B.;Dugger, Michael T.
通讯作者: Dugger, Michael T.
DOI: 10.1016/s0257-8972(99)00431-4
发表时间: 1999-11
影响因子: 5.4
作者:
Da-yung Wang;Chi-Lung Chang;Zie-Yih Chen;W. Ho
通讯作者: Da-yung Wang;Chi-Lung Chang;Zie-Yih Chen;W. Ho
DOI: 10.1007/s11249-013-0233-8
发表时间: 2013-12-01
期刊: TRIBOLOGY LETTERS
影响因子: 3.2
作者:
Khare, H. S.;Burris, D. L.
通讯作者: Burris, D. L.