Post-growth annealing study of heavily Ga-doped zinc oxide grown by radio frequency magnetron sputtering

Post-growth annealing study of heavily Ga-doped zinc oxide grown by radio frequency magnetron sputtering
复制标题

射频磁控溅射生长重Ga掺杂氧化锌的生长后退火研究

DOI:
10.1088/0022-3727/46/13/135104
复制
发表时间:
2013-04
期刊:
Journal of Physics D: Applied Physics
影响因子:
--
通讯作者:
Zhu, D. L.
Zhu, D. L.
中科院分区:
其他
文献类型:
--
作者:
Su, S. C.;Ling, C. C.;Lu, Y. M.;Zhu, D. L.

文献摘要

参考文献

被引文献

相似文献

采用射频磁控溅射法制备了高掺杂ga掺杂ZnO(电阻率~ 8 × 10−4 Ω cm,透过率96%)。在H2-Ar和纯Ar气氛下进行了生长后退火研究。没有明显的热诱导缺陷
Heavily doped Ga-doped ZnO (resistivity ∼8 × 10−4 Ω cm and optical transmittance 96%) were fabricated by radio frequency magnetron sputtering. Post-growth annealing studies in H2–Ar and pure Ar atmospheres were conducted. No noticeable thermal-induced cha
DOI: 10.1016/s0040-6090(96)08862-1
发表时间: 1996-11
期刊: Thin Solid Films
影响因子: 2.1
作者:
G. Hirata;J. McKittrick;T. Cheeks;J. Siqueiros;J. Díaz;O. Contreras;O. A. Lopez
通讯作者: G. Hirata;J. McKittrick;T. Cheeks;J. Siqueiros;J. Díaz;O. Contreras;O. A. Lopez
DOI: 10.1103/physrevb.75.245206
发表时间: 2007-06
期刊: Physical Review B
影响因子: 3.7
作者:
Z. Q. Chen;Shao-jie Wang;M. Maekawa;A. Kawasuso;H. Naramoto;Xiao-li Yuan;T. Sekiguchi
通讯作者: Z. Q. Chen;Shao-jie Wang;M. Maekawa;A. Kawasuso;H. Naramoto;Xiao-li Yuan;T. Sekiguchi
DOI: 10.1016/s0040-6090(02)00286-9
发表时间: 2002-05-01
期刊: THIN SOLID FILMS
影响因子: 2.1
作者:
Cheong, KY;Muti, N;Ramanan, SR
通讯作者: Ramanan, SR
DOI: 10.1016/s0169-4332(01)00583-9
发表时间: 2001-11-12
影响因子: 6.7
作者:
Surdu-Bob, CC;Saied, SO;Sullivan, JL
通讯作者: Sullivan, JL
DOI: 10.1063/1.2838326
发表时间: 2008-01
影响因子: 4
作者:
Wang Ranshi;Q. Gu;C. Ling;H. Ong
通讯作者: Wang Ranshi;Q. Gu;C. Ling;H. Ong