Effect of tunneling layers on the performances of floating-gate based organic thin-film transistor nonvolatile memories

Effect of tunneling layers on the performances of floating-gate based organic thin-film transistor nonvolatile memories
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隧道层对浮栅有机薄膜晶体管非易失性存储器性能的影响

DOI:
10.1063/1.4896665
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发表时间:
2014-09
影响因子:
4
通讯作者:
Xie W.
Xie W.
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
Han J.;Ying J.;Xiang L.;Xie W.

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Two types of floating-gate based organic thin-film transistor nonvolatile memories (FG-OTFT-NVMs) were demonstrated, with poly(methyl methacrylate co glycidyl methacrylate) (P(MMA-GMA)) and tetratetracontane (TTC) as the tunneling layer, respectively. Their device performances were measured and compared. In the memory with a P(MMA-GMA) tunneling layer, typical unipolar hole transport was obtained with a relatively small mobility of 0.16 cm2/V s. The unidirectional shift of turn-on voltage (Von) due to only holes trapped/detrapped in/from the floating gate resulted in a small memory window of 12.5 V at programming/erasing voltages (VP/VE) of ±100 V and a nonzero reading voltage. Benefited from the well-ordered molecule orientation and the trap-free surface of TTC layer, a considerably high hole mobility of 1.7 cm2/V s and a visible feature of electrons accumulated in channel and trapped in floating-gate were achieved in the memory with a TTC tunneling layer. High hole mobility resulted in a high on current...
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