Monolithically integrated tri-axis shock accelerometers with MHz-level high resonant-frequency
Monolithically integrated tri-axis shock accelerometers with MHz-level high resonant-frequency
复制标题
具有 MHz 级高谐振频率的单片集成三轴冲击加速度计
DOI:
10.1088/1361-6439/aa70c1
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发表时间:
2017-06
影响因子:
2.3
通讯作者:
Li Xinxin
中科院分区:
文献类型:
--
作者:
Zou Hongshuo;Wang Jiachou;Chen Fang;Bao Haifei;Jiao Ding;Zhang Kun;Song Zhaohui;Li Xinxin
This paper reports a novel monolithically integrated tri-axis high-shock accelerometer with high resonant-frequency for the detection of a broad frequency-band shock signal. For the first time, a resonant-frequency as high as about 1.4 MHz is designed for all the x-, y- and z-axis accelerometers of the integrated tri-axis sensor. In order to achieve a wide frequency-band detection performance, all the three sensing structures are designed into an axially compressed/stretched tiny-beam sensing scheme, where the p + -doped tiny-beams are connected into a Wheatstone bridge for piezoresistive output. By using ordinary (1 1 1) silicon wafer (i.e. non-SOI wafer), a single-wafer based fabrication technique is developed to monolithically integrate the three sensing structures for the tri-axis sensor. Testing results under high-shock acceleration show that each of the integrated three-axis accelerometers exhibit about 1.4 MHz resonant-frequency and 0.2–0.4 µV/V/g sensitivity. The achieved high frequencies for all the three sensing units make the tri-axis sensor promising in high fidelity 3D high-shock detection applications.
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DOI:
10.1016/s1386-2766(00)x8001-2
发表时间:
2000-10
期刊:
--
影响因子:
--
作者:
M. Bao
通讯作者:
M. Bao
影响因子:
4.6
作者:
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通讯作者:
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DOI:
10.1109/esscirc.2013.6649059
发表时间:
2013-10
期刊:
2013 Proceedings of the ESSCIRC (ESSCIRC)
影响因子:
--
作者:
S. Finkbeiner
通讯作者:
S. Finkbeiner
DOI:
10.1109/essderc.2013.6818809
发表时间:
2013-09
期刊:
2013 Proceedings of the European Solid-State Device Research Conference (ESSDERC)
影响因子:
--
作者:
S. Finkbeiner
通讯作者:
S. Finkbeiner
DOI:
10.1109/jproc.2009.2013612
发表时间:
2009
期刊:
Proceedings of the IEEE. Institute of Electrical and Electronics Engineers
影响因子:
--
作者:
Barlian AA;Park WT;Mallon JR Jr;Rastegar AJ;Pruitt BL
通讯作者:
Pruitt BL