Monolithic integration of embedded III-V lasers on SOI.
Monolithic integration of embedded III-V lasers on SOI.
复制标题
DOI:
10.1038/s41377-023-01128-z
复制
发表时间:
2023-04-03
影响因子:
19.4
通讯作者:
Wang, Ting
中科院分区:
文献类型:
--
作者:
Wei, Wen-Qi;He, An;Yang, Bo;Wang, Zi-Hao;Huang, Jing-Zhi;Han, Dong;Ming, Ming;Guo, Xuhan;Su, Yikai;Zhang, Jian-Jun;Wang, Ting
Silicon photonic integration has gained great success in many application fields owing to the excellent optical device properties and complementary metal-oxide semiconductor (CMOS) compatibility. Realizing monolithic integration of III-V lasers and silicon photonic components on single silicon wafer is recognized as a long-standing obstacle for ultra-dense photonic integration, which can provide considerable economical, energy-efficient and foundry-scalable on-chip light sources, that has not been reported yet. Here, we demonstrate embedded InAs/GaAs quantum dot (QD) lasers directly grown on trenched silicon-on-insulator (SOI) substrate, enabling monolithic integration with butt-coupled silicon waveguides. By utilizing the patterned grating structures inside pre-defined SOI trenches and unique epitaxial method via hybrid molecular beam epitaxy (MBE), high-performance embedded InAs QD lasers with monolithically out-coupled silicon waveguide are achieved on such template. By resolving the epitaxy and fabrication challenges in such monolithic integrated architecture, embedded III-V lasers on SOI with continuous-wave lasing up to 85 °C are obtained. The maximum output power of 6.8 mW can be measured from the end tip of the butt-coupled silicon waveguides, with estimated coupling efficiency of approximately -6.7 dB. The results presented here provide a scalable and low-cost epitaxial method for the realization of on-chip light sources directly coupling to the silicon photonic components for future high-density photonic integration.
登录
查看更多内容
影响因子:
10.8
作者:
Tian, Bin;Wang, Zhechao;Van Thourhout, Dries
通讯作者:
Van Thourhout, Dries
影响因子:
3.8
作者:
Norman, Justin;Kennedy, M. J.;Bowers, John E.
通讯作者:
Bowers, John E.
影响因子:
64.8
作者:
通讯作者:
--
影响因子:
20.6
作者:
Komljenovic, Tin;Huang, Duanni;Bowers, John E.
通讯作者:
Bowers, John E.
影响因子:
7.6
作者:
Chen, Jia-Jian;Wei, Wen-Qi;Zhang, Jian-Jun
通讯作者:
Zhang, Jian-Jun