Fabrication of Large-Area Suspended MEMS Structures Using GaN-on-Si Platform

Fabrication of Large-Area Suspended MEMS Structures Using GaN-on-Si Platform
复制标题

使用 GaN-on-Si 平台制造大面积悬浮 MEMS 结构

DOI:
10.1109/led.2009.2028905
复制
发表时间:
2009-09
影响因子:
4.9
通讯作者:
Zhang, Baoshun
Zhang, Baoshun
中科院分区:
工程技术2区
文献类型:
--
作者:
Yan, Guizhen;Cai, Yong;Yang, Zhenchuan;Lin, Wenkui;Lv, Jianan;Chen, Kevin J.;Zhang, Baoshun

文献摘要

参考文献

被引文献

相似文献

在这封信中,具有大尺寸的悬浮氮化镓(GaN)微结构的压敏元件制造与两步干释放技术使用的GaN上的Si平台。悬浮微结构与高压敏AlGaN/GaN异质结构集成为传感单元,实现GaN基集成微传感器。为了表征所制造的微结构的残余应力分布,采用了显微拉曼光谱。采用该工艺制作了一个250 × 250-mum 2质量标准面积的微加速度计结构,并通过弯曲实验对集成传感元件的压电响应特性进行了表征。
In this letter, piezosensitive elements featuring large-size suspended gallium nitride (GaN) microstructures are fabricated with a two-step dry-release technique using the GaN-on-Si platform. The suspended microstructures are integrated with highly piezosensitive AlGaN/GaN heterostructures as sensing units to realize the GaN-based integrated microsensors. To characterize the residual-stress distribution of the fabricated microstructures, micro-Raman spectroscopy is employed. A microaccelerometer structure with a 250 times 250-mum2 proof-mass area is fabricated with the proposed fabrication technique, and the piezoresponse properties of the integrated sensing elements are characterized through bending experiment.
DOI: 10.1016/j.sna.2008.12.005
发表时间: 2009-03
影响因子: 4.6
作者:
M. Placidi;J. Moreno;P. Godignon;N. Mestres;É. Frayssinet;F. Semond;C. Serre
通讯作者: M. Placidi;J. Moreno;P. Godignon;N. Mestres;É. Frayssinet;F. Semond;C. Serre
DOI: 10.1063/1.2472558
发表时间: 2007-02
影响因子: 4
作者:
S. Vicknesh;S. Tripathy;V. K. Lin;Lianshan Wang;S. Chua
通讯作者: S. Vicknesh;S. Tripathy;V. K. Lin;Lianshan Wang;S. Chua
DOI: 10.1109/iedm.2005.1609333
发表时间: 2005-12
期刊: IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest.
影响因子: --
作者:
Zhenchuan Yang;Ruonan Wang;Deliang Wang;Baoshun Zhang;K.J. Chen;K. Lau
通讯作者: Zhenchuan Yang;Ruonan Wang;Deliang Wang;Baoshun Zhang;K.J. Chen;K. Lau
DOI: 10.1063/1.3005885
发表时间: 2008-10
影响因子: 3.2
作者:
K. Tonisch;C. Buchheim;F. Niebelschütz;A. Schober;G. Gobsch;V. Cimalla;O. Ambacher;R. Goldhahn
通讯作者: K. Tonisch;C. Buchheim;F. Niebelschütz;A. Schober;G. Gobsch;V. Cimalla;O. Ambacher;R. Goldhahn
DOI: 10.1115/micronano2008-70037
发表时间: 2008
期刊: --
影响因子: --
作者:
J. Lv;Zhenchuan Yang;K. J. Chen
通讯作者: J. Lv;Zhenchuan Yang;K. J. Chen