Mechanical properties of ultrananocrystalline diamond films modified by hydrogen concentration in deposition atmosphere
Mechanical properties of ultrananocrystalline diamond films modified by hydrogen concentration in deposition atmosphere
复制标题
沉积气氛中氢浓度改变超纳米晶金刚石薄膜的机械性能
DOI：
10.1016/j.surfcoat.2013.07.005
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发表时间：
2013-12
影响因子：
5.4
通讯作者：
Lu, F.X.
中科院分区：
文献类型：
--
作者：
Liu, J.;Hei, L.F.;Chen, G.C.;Li, C.M.;Song, J.H.;Lu, F.X.
采用微波等离子体化学气相沉积法，利用富氩CH 4/H2/Ar等离子体在硅衬底上制备了超纳米金刚石薄膜。在不同气氛下沉积得到不同尺寸的晶粒，并通过X射线衍射（XRD）测量沉积后晶粒的尺寸。通过改变沉积气氛中氢含量（5%~ 20%），研究了晶粒尺寸对超纳米金刚石（UNCD）薄膜形貌发展和力学性能的影响。用扫描电子显微镜（SEM）和表面轮廓仪对其形貌进行了表征。通过纳米压痕和纳米划痕实验研究了氢浓度对UNCD薄膜力学性能的影响。结果表明，随着氢浓度的增加，晶粒尺寸、生长速率和表面粗糙度均增大。这改变了从颗粒状到针状簇的膜的形态。还可以看出，弹性模量随着氢的添加而增加;硬度从5%到15%的氢单调增加，然后在20%的氢时降低，在15%的氢时达到最大值;并且弹性恢复率为72- 78%。硬度和韧性对涂层的性能起决定性作用。划痕试验证明了高达45 mN的UNCD涂层的强附着力及其对硅基材的保护作用。氢对合金的力学性能有显著影响。详细的实验结果和失效机制的UNCD膜沉积在富氩等离子体进行了讨论。所沉积的高度光滑的UNCD膜也有望应用于医疗植入物、表面声波（SAW）器件和微机电系统（MEMS）。
Ultrananocrystalline diamond (UNCD) films on silicon were prepared by microwave plasma chemical vapor deposition method using argon-rich CH4/H2/Ar plasmas. The grains with different sizes were obtained by deposition in different atmosphere and the sizes of grain were measured after the deposition by X-ray diffraction (XRD). The influences of the grain size on the development of the morphology of ultrananocrystalline diamond (UNCD) films and their mechanical properties have been investigated by variation of hydrogen content from 5% to 20% in the deposition atmosphere. Their morphology and topography have been characterized by scanning electron microscopy (SEM) and surface profilometer. The influences of the hydrogen concentration on the mechanical properties of the deposited UNCD films are investigated by using nano-indentation and nano-scratch tests. It was found that the grain size, growth rate and surface roughness are increased with the increase of the hydrogen concentration. This changes the morphology of the films from granular to needle-like clusters. It can also be seen that the elastic modulus is increased with the addition of hydrogen; the hardness increased monotonically from 5% to 15% hydrogen, then decreased for 20% hydrogen with the maximum at 15% hydrogen; and the elastic recovery is 72–78%. Hardness and toughness are all decisive for protecting nature of the coatings. The scratch tests proved a strong adhesion of the UNCD coatings up to 45 mN and their protective effect on silicon substrates. The hydrogen has significant influence on the mechanical properties. Detailed experimental results and failure mechanisms for UNCD film deposition in argon-rich plasma are discussed. The deposited highly smooth UNCD film is also expected to be applicable in medical implants, surface acoustic wave (SAW) devices and micro-electromechanical systems (MEMS).
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影响因子：
--
作者：
Liao WH;Wei DH;Lin CR
通讯作者：
Lin CR
影响因子：
3.2
作者：
D. Zhou;T. McCauley;L. Qin;A. Krauss;D. Gruen
通讯作者：
D. Zhou;T. McCauley;L. Qin;A. Krauss;D. Gruen
影响因子：
3.2
作者：
Chuan-Sheng Wang;Huang-Chin Chen;H. Cheng;I. Lin
通讯作者：
Chuan-Sheng Wang;Huang-Chin Chen;H. Cheng;I. Lin
DOI：
10.1016/j.ijsolstr.2008.09.036
发表时间：
2009-02
影响因子：
3.6
作者：
L. Shen;Zhen Chen
通讯作者：
L. Shen;Zhen Chen
影响因子：
3.2
作者：
W. B. Yang;F. Lü;Z. Cao
通讯作者：
W. B. Yang;F. Lü;Z. Cao