The adhesion and corrosion resistance of Ti–O films on CoCrMo alloy fabricated by high power pulsed magnetron sputtering (HPPMS)
The adhesion and corrosion resistance of Ti–O films on CoCrMo alloy fabricated by high power pulsed magnetron sputtering (HPPMS)
复制标题
高功率脉冲磁控溅射(HPPMS)技术在CoCrMo合金上制备Ti-O薄膜的附着力和耐蚀性
DOI：
10.1016/j.surfcoat.2014.04.044
复制
发表时间：
2014-08
影响因子：
5.4
通讯作者：
H. Sun
中科院分区：
文献类型：
--
作者：
B. Bai;Y.X. Leng;N. Huang;H. Sun
为了探索其在心血管支架上的潜在应用，采用高功率脉冲磁控溅射（HPPMS）技术在CoCrMo合金基体上制备了氧化钛薄膜。通过划痕试验和拉伸试验研究了Ti中间层和Ti-O薄膜厚度对薄膜附着力的影响。在不同的拉伸应变后，还通过极化试验研究了 Ti-O 涂层 CoCrMo 合金和裸 CoCrMo 合金的腐蚀行为。结果表明，沉积Ti中间层可以明显提高薄膜的附着力，且薄膜附着力随着薄膜厚度的增加而降低。此外，具有10 nm Ti中间层的30 nm Ti-O薄膜具有优异的附着力，可以承受30%的相对伸长率而没有明显的分层。 Ti-O涂层CoCrMo合金在不同拉伸应变后的耐腐蚀性能均优于裸CoCrMo合金。由于HPPMS Ti-O薄膜在不同拉伸应变后具有良好的附着力和耐腐蚀性，因此在CoCrMo合金心血管支架表面改性方面具有潜在的应用前景。
In order to explore the potential application on cardiovascular stent, titanium oxide films were fabricated on CoCrMo alloy substrate by high power pulsed magnetron sputtering (HPPMS). The effect of Ti interlayer and thickness of Ti–O film on the film adhesion was investigated by the scratch test and tension test. After different tensile strain, the corrosion behavior of Ti–O coated CoCrMo alloy and bare CoCrMo alloy was also investigated by polarization tests. The results showed that the deposition of Ti interlayer can obviously improve the film adhesion and the film adhesion decreased with film thickness increase. In addition, the 30 nm Ti–O film with 10 nm Ti interlayer had excellent adhesion and it could withstand 30% relative elongation without obvious delamination. The corrosion resistance of Ti–O coated CoCrMo alloy was superior to bare CoCrMo alloy after different tensile strain. Due to its good adhesion and corrosion resistance after different tensile strain, the HPPMS Ti–O film had a potential application on CoCrMo alloy cardiovascular stent surface modification.
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影响因子：
5.4
作者：
Y. Leng;N. Huang;P. Yang;Jun-ying Chen;Hong Sun;J. Wang;G. Wan;X. Tian;R. Fu;L. Wang;P. Chu
通讯作者：
Y. Leng;N. Huang;P. Yang;Jun-ying Chen;Hong Sun;J. Wang;G. Wan;X. Tian;R. Fu;L. Wang;P. Chu
影响因子：
5.4
作者：
Y. Leng;J. Chen;H. Sun;P. Yang;G. Wan;J. Wang;N. Huang
通讯作者：
Y. Leng;J. Chen;H. Sun;P. Yang;G. Wan;J. Wang;N. Huang
影响因子：
37.8
作者：
S. Windecker;R. Simon;M. Lins;V. Klauss;F. Eberli;M. Roffi;G. Pedrazzini;T. Moccetti;P. Wenaweser;M. Togni;D. Tüller;R. Zbinden;C. Seiler;J. Mehilli;A. Kastrati;B. Meier;O. Hess
通讯作者：
S. Windecker;R. Simon;M. Lins;V. Klauss;F. Eberli;M. Roffi;G. Pedrazzini;T. Moccetti;P. Wenaweser;M. Togni;D. Tüller;R. Zbinden;C. Seiler;J. Mehilli;A. Kastrati;B. Meier;O. Hess
影响因子：
3.8
作者：
J. Alami;J. Gudmundsson;J. Bohlmark;J. Birch;U. Helmersson
通讯作者：
J. Alami;J. Gudmundsson;J. Bohlmark;J. Birch;U. Helmersson
DOI：
10.1116/1.582380
发表时间：
2000-07-01
期刊：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
影响因子：
--
作者：
Mac치k, K;Kouznetsov, V;Petrov, I
通讯作者：
Petrov, I