Discrete relaxation method for hybrid e-beam and triple patterning lithography layout decomposition
Discrete relaxation method for hybrid e-beam and triple patterning lithography layout decomposition
复制标题
混合电子束和三重图案光刻布局分解的离散松弛方法
DOI:
10.1007/s12652-021-02939-x
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发表时间:
2021-02
影响因子:
--
通讯作者:
Yeh-Cheng Chen
中科院分区:
文献类型:
--
作者:
Xingquan Li;Jiangkao Li;Hongxi Wu;Yeh-Cheng Chen
Hybrid electron beam lithography (EBL) and triple patterning lithography (TPL) is an advanced technology for IC manufacture. To solve the hybrid EBL and TPL layout decomposition problem (HETLD), we propose a discrete relaxation method in this paper. Existed works hard to evaluate the quality of the obtained results theoretically. Our discrete relaxation is the first approach which can be used to evaluate the solution quality. First, we introduce an extended minimum weight dominating set coloring problem (EMDSC). We show that the EMDSC problem is a discrete relaxation of the HETLD problem, which is solved by an integer linear programming (ILP) approach. Second, we legalize the relaxation solution to a feasible solution of the initial problem by inserting stitches and assigning EBLs. Experimental results show that our method achieves the near-optimal solution.
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DOI:
10.1109/aspdac.2014.6742880
发表时间:
2014-02
期刊:
2014 19th Asia and South Pacific Design Automation Conference (ASP-DAC)
影响因子:
--
作者:
Jhih-Rong Gao;Bei Yu;D. Pan
通讯作者:
Jhih-Rong Gao;Bei Yu;D. Pan
DOI:
10.1109/aspdac.2015.7059082
发表时间:
2015-03
期刊:
The 20th Asia and South Pacific Design Automation Conference
影响因子:
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DOI:
10.1145/2228360.2228579
发表时间:
2012-06
期刊:
DAC Design Automation Conference 2012
影响因子:
--
作者:
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通讯作者:
Shao-Yun Fang;Yao-Wen Chang;Wei-Yu Chen
DOI:
10.1117/12.2046499
发表时间:
2014-03
期刊:
--
影响因子:
--
作者:
Haitong Tian;Hongbo Zhang;Zigang Xiao;Martin D. F. Wong
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Haitong Tian;Hongbo Zhang;Zigang Xiao;Martin D. F. Wong
DOI:
10.1016/j.ins.2018.03.003
发表时间:
2018-06
期刊:
Inf. Sci.
影响因子:
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作者:
Jia Wang;Xianming Zhang;Yufeng Lin;Xiaohua Ge;Q. Han
通讯作者:
Jia Wang;Xianming Zhang;Yufeng Lin;Xiaohua Ge;Q. Han