Domain boundaries in ScAlMgO<sub>4</sub> single crystal observed by synchrotron radiation x-ray topography and reticulography
Domain boundaries in ScAlMgO<sub>4</sub> single crystal observed by synchrotron radiation x-ray topography and reticulography
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同步辐射X射线形貌和网状成像观察ScAlMgO<sub>4</sub>单晶晶畴边界
DOI:
10.1088/1361-6641/ac974b
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发表时间:
2022
影响因子:
1.9
通讯作者:
Ishikawa Yukari
中科院分区:
文献类型:
--
作者:
Yao Yongzhao;Hirano Keiichi;Sugawara Yoshihiro;Ishikawa Yukari
We performed synchrotron radiation x-ray topography (XRT) and reticulography to observe dislocations and crystal misorientation at domain boundaries (DBs) in a scandium magnesium aluminate single-crystal substrate grown via the Czochralski method. By inserting a fine-scale x-ray-absorbing mesh between the sample and the topograph-recording medium, reticulography was clearly observed allowing for direct measurement of twist and tile domain misorientation> 5× 10− 5 rad. The results show that the angular resolution can be further improved to better than 2× 10− 5 rad by applying a different mesh-to-film distance M and then comparing the relative displacement in their reticulographs. The character of dislocations aligning at the DBs revealed by XRT analysis is consistent with the reticulography results. Finally, we demonstrate a method that combines reticulography and XRT into a single reticulographic XRT image, from which dislocation observation and misorientation measurement can be performed simultaneously.
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影响因子:
2.3
作者:
Ohnishi Kazuki;Kanoh Masaya;Tanikawa Tomoyuki;Kuboya Shigeyuki;Mukai Takashi;Matsuoka Takashi
通讯作者:
Matsuoka Takashi
影响因子:
1.8
作者:
Yongzhao Yao;Y. Ishikawa;Y. Sugawara;Kōji Sato;K. Danno;H. Suzuki;T. Bessho;S. Yamaguchi;K. Nishikawa
通讯作者:
K. Nishikawa
影响因子:
3.2
作者:
Hanada Takashi;Tajiri Hiroo;Sakata Osami;Fukuda Tsuguo;Matsuoka Takashi
通讯作者:
Matsuoka Takashi
DOI:
10.4028/www.scientific.net/msf.600-603.305
发表时间:
2008
期刊:
Materials Science Forum
影响因子:
--
作者:
I. Kamata;M. Nagano;H. Tsuchida;Yi Chen;M. Dudley
通讯作者:
M. Dudley
DOI:
10.1088/0022-3727/38/10a/001
发表时间:
2005
期刊:
Journal of Physics D: Applied Physics
影响因子:
--
作者:
A. R. Lang
通讯作者:
A. R. Lang