Substrate surface effect on the structure of cubic BN thin films from synchrotron-based X-ray diffraction and reflection

Substrate surface effect on the structure of cubic BN thin films from synchrotron-based X-ray diffraction and reflection
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基于同步加速器的 X 射线衍射和反射研究基底表面对立方 BN 薄膜结构的影响

DOI:
10.1016/j.apsusc.2012.11.083
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发表时间:
2013-02
影响因子:
6.7
通讯作者:
Zhou, X. T.
Zhou, X. T.
中科院分区:
材料科学1区
文献类型:
--
作者:
Zhang, X. M.;Wen, W.;Li, X. L.;He, Q.;Zhou, X. T.

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利用同步辐射掠入射X射线衍射(GI-XRD)和X射线反射率(XRR)测量技术,研究了采用质量选择离子束沉积技术(MSIBD)在不同表面粗糙度的Si衬底上制备的立方氮化硼(cBN)薄膜。BN薄膜主要由两相组成。一种是cBN相,另一种是六方BN(hBN)相。薄膜的立方相含量取决于其相应基底的粗糙度。光滑的衬底表面有利于cBN相的形核。cBN相主要生长在薄膜的近表面区域,在薄膜-衬底界面处存在hBN中间层。GIXRD和XRR被证明是分析cBN薄膜结构的有力工具。
Cubic BN (cBN) thin films prepared by mass-selected ion beam deposition technique (MSIBD) on Si substrates with different surface roughness were studied by synchrotron-based grazing incidence X-ray diffraction (GI-XRD) and X-ray reflectivity (XRR) measurements. The BN films are mostly composed of two phases. One is cBN phase, the other is hexagonal BN (hBN) phase. The cubic phase content of the thin films is dependent on the roughness of their corresponding substrates. The smooth substrate surface is helpful for the nucleation of the cBN phase. cBN phase is mostly grown in the near surface region of the films and there is a hBN interlayer at the film–substrate interface. GIXRD and XRR are proved to be powerful tools for analyzing the structure of the cBN thin films.
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