Experimental evaluation of uncertainty in sub-nanometer metrology using transmission electron microscopy due to magnification variation

Experimental evaluation of uncertainty in sub-nanometer metrology using transmission electron microscopy due to magnification variation
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使用透射电子显微镜对亚纳米计量中由于放大倍数变化造成的不确定性进行实验评估

DOI:
10.1088/1361-6501/ac03e4
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发表时间:
2021
影响因子:
2.4
通讯作者:
Yamamoto Kazuhiro
Yamamoto Kazuhiro
中科院分区:
工程技术3区
文献类型:
--
作者:
Kobayashi Keita;Misumi Ichiko;Yamamoto Kazuhiro

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通过比较在不同条件下获得的晶体Si样品的(220)晶格间距的测量值,实验评估了在使用透射电子显微镜(TEM)的亚纳米计量中由于放大率变化而导致的不均匀性。放大倍率的日间变化、日间重复性、TEM图像的旋转、样品交换、样品位置、散焦、透镜的磁滞、投影透镜畸变和测量误差被视为不确定度分量。所得到的结果表明,主要的不确定性成分是日间放大率的变化,一天内的重复性,涉及不均匀性的试样结构,磁滞的中间透镜,和投影透镜失真。在这些组件中,预计是可行的,以抑制日间放大倍率的变化到一个可以忽略的水平,通过日常放大倍率校准,这表明,由于中间透镜的磁滞,投影透镜失真,和样品结构的不均匀性,将是进一步降低使用TEM的亚纳米计量的不确定性的关键因素,以尽量减少不确定性。此外,我们发现,放大率校准使用适当的参考材料(如晶体硅的晶格条纹)之前,每次测量应使亚纳米计量的相对不确定度为3.2%,即使样品被引入到TEM系统的样品交换放大率校准后。
Uncertainties due to the magnification variation in sub-nanometer metrology using transmission electron microscopy (TEM) were experimentally evaluated by comparing the measured values of the (220) lattice spacing of a crystalline Si specimen acquired under various conditions. Interday variation of the magnification, intraday repeatability, rotation of the TEM image, specimen exchange, specimen position, defocusing, magnetic hysteresis of the lenses, projection lens distortion, and measurement errors were considered as the uncertainty components. The obtained results reveal that the major uncertainty components are the interday magnification variation, intraday repeatability involving nonuniformity of the specimen structure, magnetic hysteresis of the intermediate lenses, and projection lens distortion. Among these components, it is expected to be feasible to suppress the interday magnification variation to a negligible level by daily magnification calibration, suggesting that minimizing the uncertainties due to magnetic hysteresis of the intermediate lenses, projection lens distortion, and nonuniformity of the specimen structure will be the key factor for further reducing the uncertainty of sub-nanometer metrology using TEM. Furthermore, we found that magnification calibration using an appropriate reference material (eg the lattice fringes of crystalline Si) before every measurement should enables sub-nanometer metrology with a relative uncertainty of 3.2%, even if the specimen is introduced into the TEM system by specimen exchange after magnification calibration.
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影响因子: 3.2
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