An alternative GaSb substrate allowing close-spaced sublimation of Cd0.9Zn0.1Te epitaxial thick film for radiation detectors
An alternative GaSb substrate allowing close-spaced sublimation of Cd0.9Zn0.1Te epitaxial thick film for radiation detectors
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一种替代的 GaSb 衬底,允许辐射探测器的 Cd0.9Zn0.1Te 外延厚膜近距离升华
DOI:
10.1016/j.mssp.2022.106688
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发表时间:
2022
影响因子:
4.1
通讯作者:
Wanqi Jie
中科院分区:
文献类型:
--
作者:
Yang Li;Kun Cao;Gangqiang Zha;Xinlei Zhang;Xin Wan;Dou Zhao;Yajie Liu;Wanqi Jie
Abstract Cd 0.9 Zn 0.1 Te have been used for the high-performance room-temperature nuclear radiation detectors for decades. However, searching for more efficient growth methods of high-quality crystals is still an attractive research topic. This study proved the successful growth of high quality Cd 0.9 Zn 0.1 Te epitaxial thick films on GaSb (001) substrates using close-spaced sublimation method, where the lattice mismatch between GaSb and Cd 0.9 Zn 0.1 Te was− 5.7%, much smaller than that between GaAs and Cd 0.9 Zn 0.1 Te (− 13.9%). The interfacial mismatch dislocations on CdZnTe/GaSb heterojunctions were found to be much less than those of CdZnTe/GaAs, as confirmed by cross-sectional selected area electron diffraction patterns and high angle annular dark field images of transmission electron microscopy. Compared to Au/CdZnTe/GaAs, the FWHM of double crystal X-ray rocking curve and leakage current of Au/CdZnTe/GaSb detector were lower, and the resistivity and (μ τ) e were higher. The detector made from the as-grown CdZnTe/GaSb thick film was demonstrated to possess the energy resolution of 17% for 241 Am@ 59.54 KeV γ ray energy spectrum, indicated the potential application of GaSb as a suitable substrate for detector-grade CdZnTe film growth.
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影响因子:
1.8
作者:
S. Tobenas;E. M. Larramendi;E. Purón;O. Melo;F. Cruz-Gandarilla;M. Hesiquio-Garduño;M. Tamura
通讯作者:
S. Tobenas;E. M. Larramendi;E. Purón;O. Melo;F. Cruz-Gandarilla;M. Hesiquio-Garduño;M. Tamura
影响因子:
3.1
作者:
Junning Gao;W. Jie;Yanyan Yuan;Tao Wang;Yong Xie;Ya-bao Wang;Yuhong Huang;Junli Tong;Hui Yu-Hui-Y
通讯作者:
Junning Gao;W. Jie;Yanyan Yuan;Tao Wang;Yong Xie;Ya-bao Wang;Yuhong Huang;Junli Tong;Hui Yu-Hui-Y
影响因子:
3.9
作者:
F. Nicoll
通讯作者:
F. Nicoll
DOI:
10.1016/j.nima.2004.05.071
发表时间:
2004-09-21
影响因子:
1.4
作者:
Owens, A;Peacock, A
通讯作者:
Peacock, A
DOI:
10.1016/j.nima.2006.01.110
发表时间:
2006-07
影响因子:
1.4
作者:
P. Sellin
通讯作者:
P. Sellin