Hydrogenated diamond-like carbon film prepared by RF bias assisting magnetron sputtering
Hydrogenated diamond-like carbon film prepared by RF bias assisting magnetron sputtering
复制标题
射频偏压辅助磁控溅射制备氢化类金刚石碳薄膜
DOI：
10.1088/2053-1591/ab1209
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发表时间：
2019-04
影响因子：
2.3
通讯作者：
Zhou Kechao
中科院分区：
文献类型：
--
作者：
Ren Xuelei;Zhu Hekang;Liu Na;Wei Qiuping;Pu Jiaxuan;Ma Li;Wang Yijia;Xie Youneng;Wei Bingqiang;Yu Zhiming;Zhou Kechao
磁控溅射是工业中沉积硬质涂层的有效方法。然而，对于氢化类金刚石碳（DLC:H）薄膜来说，反应气体的电离率较低，导致机械性能较差。这里，为了提高沉积DLC:H过程中C2H2的电离率，精心设计了射频（RF）偏压辅助磁控溅射系统。随着射频偏压的增加，非晶碳中的富勒烯消失，氢含量降低，sp3 C比增加。成功沉积硬度为33 GPa的DLC:H薄膜，其弹性恢复率超过75%。 DLC:H 的高机械性能主要归因于高 sp3 C 比率，这主要是由 RF 偏压的增强电离贡献的。本文认为，射频偏压辅助磁控溅射是一种经济有效的沉积具有优异机械性能的DLC:H的方法，并且具有工业化大规模生产的前景。
Magnetron sputtering is an efficient way to deposit hard coatings in industry. However, as for hydrogenated diamond-like carbon (DLC:H) film, the low ionization rate of reaction gases causes poor mechanical properties. Here, in order to improve the ionization rate of C2H2 during depositing DLC:H, a radio frequency (RF) bias assisting magnetron sputtering system was elaborated. With increasing the RF bias voltage, the fullerene in the amorphous carbon are disappeared, accompanied with decrease of hydrogen content and increase of the sp3 C ratio. DLC:H film with a hardness of 33 GPa is successfully deposited, and its elastic recovery is over 75%. The high mechanical properties of DLC:H is mainly due to the high sp3 C ratio, which is primarily contributed by the enhanced ionization of the RF bias. This paper suggests that the RF bias assisting magnetron sputtering is an economical and efficient method to deposit DLC:H with superior mechanical property, and it is promising for industrial mass production.
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