Non-uniform stresses in thin high temperature superconducting films under electromagnetic force: General models of curvature-stress relations and experimental results
Non-uniform stresses in thin high temperature superconducting films under electromagnetic force: General models of curvature-stress relations and experimental results
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电磁力作用下高温超导薄膜的非均匀应力：曲率-应力关系的一般模型和实验结果
DOI：
10.1063/1.5109171
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发表时间：
2019-11
影响因子：
3.2
通讯作者：
Youhe Zhou
中科院分区：
文献类型：
--
作者：
Cong Liu;Xingyi Zhang;Youhe Zhou
高温超导（HTS）薄膜中的强通量钉扎显着提高了其承载大电流的能力；然而，它反过来会在高温超导薄膜中产生巨大的电磁力，因此电磁力下的薄膜应力评估对于评估其可靠性是必不可少的。在这项工作中，首先，提出了一个分析模型，用于评估置于垂直磁场中的 HTS 薄膜中电磁力引起的应力。在此模型中，我们通过电磁体力将曲率与薄膜应力联系起来，其机制与失配应变或热失配等常见薄膜应力源非常不同。新模型表明，薄膜应力不仅取决于基板同一点的“局部”曲率，还取决于其他点的“非局部”曲率。接下来，采用用于低温测量的相干梯度传感器系统来监测高温超导薄膜在磁化和退磁过程中的应力状态。最后，获得了在不同磁场作用下YBa2Cu3O7 − x薄膜的环向应力、径向应力以及薄膜与(00l)SrTiO3衬底之间界面处的剪切应力的全场，并且所有应力均表现出不可逆行为，这在薄HTS薄膜-衬底系统中首次通过实验发现。高温超导(HTS)薄膜中的强磁通钉扎显着提高了其承载大电流的能力；然而，它反过来会在高温超导薄膜中产生巨大的电磁力，因此电磁力下的薄膜应力评估对于评估其可靠性是必不可少的。在这项工作中，首先，提出了一个分析模型，用于评估置于垂直磁场中的 HTS 薄膜中电磁力引起的应力。在此模型中，我们通过电磁体力将曲率与薄膜应力联系起来，其机制与失配应变或热失配等常见薄膜应力源非常不同。新模型表明，薄膜应力不仅取决于基板同一点的“局部”曲率，还取决于其他点的“非局部”曲率。接下来，采用用于低温测量的相干梯度传感器系统来监测高温超导薄膜在磁力过程中的应力状态。
Strong flux pinning in high temperature superconducting (HTS) film has significantly boosted its capability of carrying high currents; however, it, in turn, induces huge electromagnetic force in the HTS film, and hence film stress evaluation under electromagnetic force is indispensable for assessing their reliability. In this work, first, an analytical model is presented for evaluating the electromagnetic-force-induced stresses in the thin HTS film that is placed in a vertical magnetic field. In this model, we relate curvatures to film stresses through electromagnetic body force, whose mechanism is very different from common film stress sources like misfit strain or thermo mismatch. The new model shows that the film stresses depend not only on the “local” curvatures at a same point of the substrate but also on the “nonlocal” curvatures of other points. Next, a coherent gradient sensor system for cryogenic measurement is implemented to monitor the stress states of the HTS film during the processes of magnetization and demagnetization. Finally, full fields of hoop stress, radial stress of the YBa2Cu3O7 − x film, and shear stress at interface between the film and the (00l) SrTiO3 substrate subjected to various magnetic fields are obtained, and all the stresses manifest irreversible behavior, which are first experimentally found in the thin HTS film-substrate system.Strong flux pinning in high temperature superconducting (HTS) film has significantly boosted its capability of carrying high currents; however, it, in turn, induces huge electromagnetic force in the HTS film, and hence film stress evaluation under electromagnetic force is indispensable for assessing their reliability. In this work, first, an analytical model is presented for evaluating the electromagnetic-force-induced stresses in the thin HTS film that is placed in a vertical magnetic field. In this model, we relate curvatures to film stresses through electromagnetic body force, whose mechanism is very different from common film stress sources like misfit strain or thermo mismatch. The new model shows that the film stresses depend not only on the “local” curvatures at a same point of the substrate but also on the “nonlocal” curvatures of other points. Next, a coherent gradient sensor system for cryogenic measurement is implemented to monitor the stress states of the HTS film during the processes of magne...
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影响因子：
4
作者：
Xindi Wu;S. Foltyn;P. Arendt;W. Blumenthal;I. Campbell;J. Cotton;J. Coulter;W. Hults;M. Maley;H. Safar;J. Smith
通讯作者：
Xindi Wu;S. Foltyn;P. Arendt;W. Blumenthal;I. Campbell;J. Cotton;J. Coulter;W. Hults;M. Maley;H. Safar;J. Smith
影响因子：
4
作者：
R. Koch;C. Umbach;G. J. Clark;P. Chaudhari;R. Laibowitz
通讯作者：
R. Koch;C. Umbach;G. J. Clark;P. Chaudhari;R. Laibowitz
DOI：
10.1103/physrevlett.80.4757
发表时间：
1997-12
期刊：
--
影响因子：
--
作者：
Tom H. Johansen;J. Lothe;H. Bratsberg
通讯作者：
Tom H. Johansen;J. Lothe;H. Bratsberg
影响因子：
4
作者：
Dhananjay Kumar;M. Sharon;R. Pinto;P. Apte;S. Pai;S. Purandare;L. C. Gupta;R. Vijayaraghavan
通讯作者：
Dhananjay Kumar;M. Sharon;R. Pinto;P. Apte;S. Pai;S. Purandare;L. C. Gupta;R. Vijayaraghavan
DOI：
10.1016/s0921-4534(97)01799-1
发表时间：
1998-02
影响因子：
1.7
作者：
R. J. Wijngaarden;K. Heeck;H. Spoelder;R. Surdeanu;R. Griessen
通讯作者：
R. J. Wijngaarden;K. Heeck;H. Spoelder;R. Surdeanu;R. Griessen