Enhanced Work Function of Al-Doped Zinc-Oxide Thin Films by Oxygen Inductively Coupled Plasma Treatment
Enhanced Work Function of Al-Doped Zinc-Oxide Thin Films by Oxygen Inductively Coupled Plasma Treatment
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氧感应耦合等离子体处理增强掺铝氧化锌薄膜的功函数
DOI：
10.1088/1009-0630/16/1/17
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发表时间：
2014
影响因子：
1.7
通讯作者：
Liang Rongqing
中科院分区：
文献类型：
--
作者：
Yang Xilu;Yan Hang;Ou Qiongrong;Liang Rongqing
比较了氧和氯电感耦合等离子体（ICP）对掺铝氧化锌（AZO）薄膜的处理效果。采用Kelvin探针（KP）和X射线光电子能谱（XPS）对处理效果进行了表征。KP测试结果表明，AZO薄膜经氧ICP（O-ICP）处理后，其表面功函数最高可达5.92 eV，即表面功函数至少增加了1.1 eV。而经氯气ICP（Cl-ICP）处理后，功函数增加到5.44 eV，增量为0.6 eV。10天后，O-ICP处理后的功函数增量仍为0.4eV，而Cl-ICP处理后的功函数在48小时后才恢复到原来的值。XPS结果表明，O-ICP处理比Cl-ICP处理更能有效地提高AZO薄膜的功函数，这与KP结果一致。
Al-doped zinc-oxide (AZO) thin films treated by oxygen and chlorine inductively coupled plasma (ICP) were compared. Kelvin probe (KP) and X-ray photoelectron spectroscopy (XPS) were employed to characterize the effect of treatment. The results of KP measurement show that the surface work function of AZO thin films can increase up to 5.92 eV after oxygen ICP (O-ICP)'s treatment, which means that the work function was increased by at least 1.1 eV. However, after the treatment of chlorine ICP (Cl-ICP), the work function increased to 5.44 eV, and the increment was 0.6 eV. And 10 days later, the work function increment was still 0.4 eV after O-ICP's treatment, while the work function after Cl-ICP's treatment came back to the original value only after 48 hours. The XPS results suggested that the O-ICP treatment was more effective than Cl-ICP for enhancing the work function of AZO films, which is well consistent with KP results.
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