InAs/GaAs Quantum-Dot Superluminescent Light-Emitting Diode Monolithically Grown on a Si Substrate

InAs/GaAs Quantum-Dot Superluminescent Light-Emitting Diode Monolithically Grown on a Si Substrate
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Si 衬底上单片生长的 InAs/GaAs 量子点超辐射发光二极管

DOI:
10.1021/ph500162a
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发表时间:
2014
期刊:
影响因子:
7
通讯作者:
Chen S
Chen S
中科院分区:
物理与天体物理1区
文献类型:
--
作者:
Chen S

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在硅平台上构建光电子器件一直是硅光子学发展的引擎。特别是,在硅衬底上集成光学互连可以制造复杂的光电子电路,潜在地实现了芯片到芯片和系统到系统的光通信,与混合解决方案相比,成本和尺寸都大大降低。尽管人们已经在硅光产生和调制技术上投入了大量的努力,但高效的、电泵浦的硅光发射器还没有被证明。相比之下,III-V半导体器件作为光源提供了高效率。因此,在硅平台上实现III-V单片集成将是实现硅基光源的有效途径。在这里,我们描述了第一个单片生长在硅衬底上的超辐射发光二极管(SLD)。制作的两节InAs/GaAs量子点(QD)SLD以∼1255 nm为中心产生了114 nm的近似高斯发射光谱,室温下的最大输出功率为2.6 mW。这项工作是对我们之前演示的直接在硅平台上生长的InAs/GaAsQD激光器的补充,并为未来硅光子学所需的III-V光源的单片集成铺平了道路。
Building optoelectronic devices on a Si platform has been the engine behind the development of Si photonics. In particular, the integration of optical interconnects onto Si substrates allows the fabrication of complex optoelectronic circuits, potentially enabling chip-to-chip and system-to-system optical communications at greatly reduced cost and size relative to hybrid solutions. Although significant effort has been devoted to Si light generation and modulation technologies, efficient and electrically pumped Si light emitters have yet to be demonstrated. In contrast, III–V semiconductor devices offer high efficiency as optical sources. Monolithic integration of III–V on the Si platform would thus be an effective approach for realizing Si-based light sources. Here, we describe the first superluminescent light-emitting diode (SLD) monolithically grown on Si substrates. The fabricated two-section InAs/GaAs quantum-dot (QD) SLD produces a close-to-Gaussian emission spectrum of 114 nm centered at ∼1255 nm wavelength, with a maximum output power of 2.6 mW at room temperature. This work complements our previous demonstration of an InAs/GaAs QD laser directly grown on a Si platform and paves the way for future monolithic integration of III–V light sources required for Si photonics.
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