Fabrication and application of high quality poly(dimethylsiloxane) stamps by gamma ray irradiation
Fabrication and application of high quality poly(dimethylsiloxane) stamps by gamma ray irradiation
复制标题
伽马射线辐照高质量聚二甲基硅氧烷印模的制备及应用
DOI：
10.1039/c0jm03814h
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发表时间：
2011-03
影响因子：
--
通讯作者：
Wang, Peng
中科院分区：
文献类型：
--
作者：
Yang, Haijun;Li, Jingye;Hou, Zhengchi;Wang, Huabin;Li, Bin;Hu, Jun;Wang, Peng
聚二甲基硅氧烷（PDMS）是软光刻中应用最广泛的印模材料。通常采用热硫化法，不能满足分离度、纯度和溶剂相容性的要求。在这项工作中，高能量伽马射线被用来交联的PDMS基地制造邮票设计的软光刻，而不使用催化剂。以这种方式制造的PDMS印模具有几个优点，包括高分辨率、纯度和耐溶剂性。在800 kGy的吸收剂量下交联的PDMS印模在空白区域中具有0.18 nm的粗糙度，并且可以复制具有1.1 nm高度的特征。印模本体中未交联分子的量仅为“标准”印模（由Sylgard™ 184以10的碱/固化剂比率制成）的一半。此外，通过辐射诱导交联制成的印模的剪切弹性模量在400 kGy至800 kGy的范围内随着吸收剂量而增加，并且高于“标准”印模的剪切弹性模量。通过测定印模的玻璃化转变温度和计算交联剂的分子量，我们认为印模质量的提高是由于γ射线辐照下交联密度的增加。
Poly(dimethylsiloxane) (PDMS) is the most widely used stamp material in soft lithography. Usually, it is thermally vulcanized and can't satisfy all the demands of the resolution, purity and solvent compatibility. In this work, high energy gamma rays are used to crosslink the PDMS base to fabricate stamps designed for soft lithography without the use of a catalyst. PDMS stamps fabricated in this way have several advantages including high resolution, purity and solvent resistance. The PDMS stamp crosslinked at an absorbed dose of 800 kGy has a roughness of 0.18 nm in blank area and can replicate features with the height of 1.1 nm. The amount of uncrosslinked molecules in the bulk of the stamp is only half of that of the ‘standard’ stamp (made by Sylgard™ 184 at the base/cure agent ratio of 10). Furthermore, the shear elastic modulus of stamps made by radiation induced crosslinking increases with the absorbed dose in the range of 400 kGy to 800 kGy and is higher than that of ‘standard’ stamps. By measuring the glass transition temperature and calculating molecular weights between crosslinkers, we conclude that the enhancement of stamps' quality can be ascribed to the increase of crosslinking density under gamma ray irradiation.
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影响因子：
4
作者：
W. Zhou;Yonggang Huang;E. Menard;N. Aluru;J. Rogers;A. Alleyne
通讯作者：
W. Zhou;Yonggang Huang;E. Menard;N. Aluru;J. Rogers;A. Alleyne
影响因子：
4
作者：
Hsia, KJ;Huang, Y;Fulton, JM
通讯作者：
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影响因子：
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作者：
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DOI：
10.1557/proc-0921-t06-03
发表时间：
2006
期刊：
MRS Proceedings
影响因子：
--
作者：
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通讯作者：
Jinook Kim;C. H. Lee;Mikyung Park;G. Chae;I. Chung
影响因子：
10.8
作者：
Hua, F;Sun, YG;Shim, A
通讯作者：
Shim, A