Effects of tailored nitriding layers on comprehensive properties of duplex plasma-treated AlTiN coatings
Effects of tailored nitriding layers on comprehensive properties of duplex plasma-treated AlTiN coatings
复制标题
定制氮化层对双相等离子处理AlTiN涂层综合性能的影响
DOI：
10.1016/j.ceramint.2017.03.209
复制
发表时间：
2017-08
影响因子：
5.2
通讯作者：
Zhou Kesong
中科院分区：
文献类型：
--
作者：
Deng Yang;Tan Chaolin;Wang Yi;Chen Ling;Cai Panpan;Kuang Tongchun;Lei Shumei;Zhou Kesong
采用先进的等离子体辅助电弧（APA-Arc）技术，在不同N2/H2flow比的预等离子体氮化AISI-H13钢基体上沉积了双重处理的AlTiN涂层。对AlTiN涂层的显微组织和性能进行了全面表征和分析。结果表明，在等离子体渗氮过程中，N2/H2flow可以调节复合层的厚度，可以获得光亮的无复合层渗氮层。与单层AlTiN涂层相比，复合处理的AlTiN涂层的性能得到了很好的改善。双相处理能很好地增强AlTiN涂层的附着力，附着力等级由单层AlTiN涂层的h3 -4级提高到复合涂层的HF1级。此外，不同厚度复合层的复合涂层表现出不同的承载能力，无复合层的复合涂层界面附着力达到61 n。AlTiN涂层的硬度也通过双相处理得到提高，最高硬度为2935 HV0.05。同时，双相处理对AlTiN涂层的摩擦学性能也有一定的改善。
Duplex-treated AlTiN coatings were deposited by advanced plasma assisted arc (APA-Arc) technology on pre-plasma nitrided AISI-H13 steel substrates using different N2/H2flow ratios. The microstructures and properties of the AlTiN coatings were comprehensively characterized and analyzed. The results show that the N2/H2flow ratios can tailor the thickness of compound layer during plasma nitriding process and the bright nitriding layer without compound layer is achieved. The properties of duplex-treated AlTiN coatings are well improved compared with monolayer AlTiN coating. The adhesion of the AlTiN coating is well enhanced by duplex treatment process, and adhesion grade increases from HF3-4 for monolayer AlTiN coating to HF1 for composite coatings. Moreover, the composite coatings with various thickness compound layers show different load-bearing capacities, and the interfacial adhesion force of the composite coating without compound layer reaches 61 N. The hardness of AlTiN coating is also enhanced by duplex treatment with the highest hardness of 2935 HV0.05. Meanwhile, tribological properties of AlTiN coatings are also slightly improved by duplex treatments.
登录
查看更多内容
影响因子：
5.7
作者：
J. Rauch;C. Rousselot;N. Martin;C. Jacquot;J. Takadoum
通讯作者：
J. Rauch;C. Rousselot;N. Martin;C. Jacquot;J. Takadoum
阴极电弧离子镀AlTiSiN/CrSiN多层涂层的合成与表征
影响因子：
6.7
作者：
R.Y. Wang;Z.G. Li;Y.M. Chen;D.J. Fu
通讯作者：
D.J. Fu
DOI：
10.1016/j.ijrmhm.2012.10.017
发表时间：
2013-03
影响因子：
3.6
作者：
H. Du;H. Zhao;J. Xiong;Guang Xian
通讯作者：
H. Du;H. Zhao;J. Xiong;Guang Xian
影响因子：
5.2
作者：
F. Cai;C. Mohan;Ming-xi Li;Shihong Zhang
通讯作者：
F. Cai;C. Mohan;Ming-xi Li;Shihong Zhang
影响因子：
5.4
作者：
Sang-Yul Lee
通讯作者：
Sang-Yul Lee