Selective tuning of magnetization dynamics damping in Tb- and Nd-doped permalloy ultrathin films by adjacent copper nanolayers
Selective tuning of magnetization dynamics damping in Tb- and Nd-doped permalloy ultrathin films by adjacent copper nanolayers
复制标题
通过相邻铜纳米层选择性调节 Tb 和 Nd 掺杂坡莫合金超薄膜中的磁化动力学阻尼
DOI:
10.1016/j.jallcom.2016.02.129
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发表时间:
2016-07
影响因子:
6.2
通讯作者:
Zhai Y
中科院分区:
文献类型:
--
作者:
Zhang Dong;Yue Jinjin;Jiang Sheng;Zhai Ya;Zhai Ya;Du Jun;Zhai Hongru;Zhai Y
The mechanism of angular dependence of ferromagnetic resonance linewidth of dilute Tb and Nd doping in permalloy thin films with various thicknesses of adjacent copper layer are investigated by experimental approach and theoretical fitting by considering the contributions from intrinsic spin-orbit coupling, inhomogeneous broadening and two-magnon scattering. The results show that the damping coefficient α, by intrinsic contribution extracted from ferromagnetic resonance linewidth, increases from 0.0153 to 0.0218 for NiFe–Nd films and from 0.0193 to 0.0261 for NiFe–Tb films resulting from the spin pumping effect at the interface of NiFe–Nd(or Tb)/Cu as the thickness of copper layer increases from 1 nm to 15 nm. The surface magnetic anisotropy constantK1is obtained and shows an decreasing trend from positive to negative, which implies that the copper layer could reduce the surface perpendicular anisotropy. The fitting spin mixed conductivity is (2.72 ± 0.18) × 1015cm−2at NiFe–Tb/Cu interface and (2.4 ± 0.2) × 1015cm−2at Cu/NiFe–Nd interface, respectively.
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影响因子:
4
作者:
Zhang, Zongzhi;Ma, B.;Lou, S. T.;Jin, Q. Y.
通讯作者:
Jin, Q. Y.
影响因子:
2.1
作者:
J. Rantschler;B. Maranville;J. Mallett;P. Chen;R. McMichael;W. Egelhoff
通讯作者:
J. Rantschler;B. Maranville;J. Mallett;P. Chen;R. McMichael;W. Egelhoff
DOI:
10.1109/jproc.2003.811804
发表时间:
2003-05
期刊:
Proc. IEEE
影响因子:
--
作者:
S. Tehrani;J. Slaughter;M. Deherrera;Bradley N. Engel;N. Rizzo;J. Salter;M. Durlam;R. W. Dave;J. Janesky;B. Butcher;Ken Smith;G. Grynkewich
通讯作者:
S. Tehrani;J. Slaughter;M. Deherrera;Bradley N. Engel;N. Rizzo;J. Salter;M. Durlam;R. W. Dave;J. Janesky;B. Butcher;Ken Smith;G. Grynkewich
影响因子:
64.8
作者:
Jedema, FJ;Filip, AT;van Wees, BJ
通讯作者:
van Wees, BJ
影响因子:
3.4
作者:
Khvalkovskiy, A. V.;Apalkov, D.;Krounbi, M.
通讯作者:
Krounbi, M.