Fabrication of high energy X-ray compound kinoform lenses using X-ray lithography
Fabrication of high energy X-ray compound kinoform lenses using X-ray lithography
复制标题
使用 X 射线光刻技术制造高能 X 射线复合相息透镜
DOI：
10.1007/s00542-017-3304-1
复制
发表时间：
2017-02
期刊：
影响因子：
--
通讯作者：
Futing Yi
中科院分区：
文献类型：
--
作者：
Jing Liu;Weiwei Zhang;Guangcai Chang;Futing Yi
利用北京同步辐射设施的x射线光刻技术制备了镍高能x射线复合异型透镜。镍复合折射透镜的目标是聚焦50 keV的x射线，设计的最小齿状段宽度为2.5 μm。为了保持元素的最佳形态，制作了两次Au掩膜，其厚度逐渐增加。复合透镜的制作过程一般包括中间掩模（1.2 μm厚Au图案）的制作、工作掩模（12 μm厚Au图案）的制作和300 μm高透镜的制作三个部分。采用UV光刻（UV样品）和电子束直写光刻（EBDW样品）制备中间掩模进行比较，EBDW样品在每一步的形貌上都优于UV样品。在上海同步辐射设施的BL13W1光束线上，对两种样品进行了刀口扫描，在50 keV的x射线能量下，EBDW和UV样品的焦宽分别为9.2和10.4 μm，光子通量增益分别为6.9和5.4。
Nickel high energy X-ray compound kinoform lenses were fabricated by X-ray lithography technology at Beijing Synchrotron Radiation Facility. The nickel compound refractive lenses aim at focusing X-ray with 50 keV and the designed smallest width of the tooth-like segment is 2.5 μm. To keep the best morphology of the element, Au masks were made twice, whose thickness gradually increased. The fabrication process of compound lenses consists of three parts in general, including the intermediate mask (1.2 μm thick Au pattern) fabrication, the working mask (12 μm thick Au pattern) fabrication and the 300 μm high lenses fabrication. The intermediate mask was made by UV lithography (UV sample) and electron beam direct write lithography (EBDW sample) for comparison, and the EBDW sample had a better morphology than the UV sample at each step. Both samples were tested using the knife-edge scan method at BL13W1 beamline in Shanghai Synchrotron Radiation Facility, which provided the focal widths of 9.2 and 10.4 μm, and the photon flux gains of 6.9 and 5.4 for the EBDW and UV samples at an X-ray energy with 50 keV, respectively.
登录
查看更多内容
影响因子：
3.8
作者：
L. Alianelli;K. Sawhney;R. Barrett;I. Pape;A. Malik;M. Wilson
通讯作者：
L. Alianelli;K. Sawhney;R. Barrett;I. Pape;A. Malik;M. Wilson
DOI：
10.1016/s0168-9002(01)00531-9
发表时间：
2001-07
影响因子：
1.4
作者：
B. Lengeler;C. Schroer;B. Benner;T. Gunzler;M. Kuhlmann;J. Tümmler;A. Simionovici;M. Drakopoulos;A. Snigirev;I. Snigireva
通讯作者：
B. Lengeler;C. Schroer;B. Benner;T. Gunzler;M. Kuhlmann;J. Tümmler;A. Simionovici;M. Drakopoulos;A. Snigirev;I. Snigireva
影响因子：
2.3
作者：
V. Nazmov;J. Mohr;I. Greving;M. Ogurreck;F. Wilde
通讯作者：
V. Nazmov;J. Mohr;I. Greving;M. Ogurreck;F. Wilde
影响因子：
2.3
作者：
R. Luttge;D. Adam;F. Burkhardt;Falk Hoke;H. Schacke;M. Schmidt;H. Wolf;A. Schmidt
通讯作者：
R. Luttge;D. Adam;F. Burkhardt;Falk Hoke;H. Schacke;M. Schmidt;H. Wolf;A. Schmidt
影响因子：
1.6
作者：
R. Suter;D. Hennessy;C. Xiao;U. Lienert
通讯作者：
R. Suter;D. Hennessy;C. Xiao;U. Lienert