Properties of SiCN Films Relevant to Dental Implant Applications.
Properties of SiCN Films Relevant to Dental Implant Applications.
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DOI：
10.3390/ma16155318
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发表时间：
2023-07-28
期刊：
影响因子：
3.4
通讯作者：
Esquivel-Upshaw, Josephine F.
中科院分区：
文献类型：
--
作者：
Xia, Xinyi;Chiang, Chao-Ching;Gopalakrishnan, Sarathy K.;Kulkarni, Aniruddha V.;Ren, Fan;Ziegler, Kirk J.;Esquivel-Upshaw, Josephine F.
关键词：
表面涂层的应用是提高医疗和牙科植入物材料性能的流行技术。通过在 SiC 中引入氮而获得的三元硅碳氮化物（SiCN）由于其潜在的优势而引起了人们的极大兴趣。本研究调查了通过 PECVD 沉积的用于牙科种植体涂层的 SiCN 薄膜的特性。通过调节 NH3、CH4 和 SiH4 的气体流量来分析化学成分、光学和摩擦学性能。结果表明，NH3 流速的增加导致更高的沉积速率，从 NH3 流速 2 sccm 时的 5.7 nm/min 缩放至 NH3 流速 8 sccm 时的 7 nm/min。同时，观察到N-Si键的形成。氮含量较高的薄膜表现出较低的折射率，随着 NH3 流量从 2 sccm 增加到 8 sccm，折射率从 2.5 降低到 2.3。 SiCN 薄膜的接触角差异极小，而腐蚀速率则取决于环境的 pH 值。这些发现有助于更好地了解 SiCN 薄膜在牙科植入物中的特性和潜在应用。
The application of surface coatings is a popular technique to improve the performance of materials used for medical and dental implants. Ternary silicon carbon nitride (SiCN), obtained by introducing nitrogen into SiC, has attracted significant interest due to its potential advantages. This study investigated the properties of SiCN films deposited via PECVD for dental implant coatings. Chemical composition, optical, and tribological properties were analyzed by adjusting the gas flow rates of NH3, CH4, and SiH4. The results indicated that an increase in the NH3 flow rate led to higher deposition rates, scaling from 5.7 nm/min at an NH3 flow rate of 2 sccm to 7 nm/min at an NH3 flow rate of 8 sccm. Concurrently, the formation of N-Si bonds was observed. The films with a higher nitrogen content exhibited lower refractive indices, diminishing from 2.5 to 2.3 as the NH3 flow rate increased from 2 sccm to 8 sccm. The contact angle of SiCN films had minimal differences, while the corrosion rate was dependent on the pH of the environment. These findings contribute to a better understanding of the properties and potential applications of SiCN films for use in dental implants.
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DOI：
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