Characterisation and modelling of nonlinear resonance behaviour on very-high-frequency silicon nanoelectromechanical resonators

Characterisation and modelling of nonlinear resonance behaviour on very-high-frequency silicon nanoelectromechanical resonators
复制标题

甚高频硅纳米机电谐振器非线性谐振行为的表征和建模

DOI:
10.1016/j.mne.2023.100212
复制
发表时间:
2023
影响因子:
--
通讯作者:
Ben F
Ben F
中科院分区:
--
文献类型:
--
作者:
Ben F

文献摘要

参考文献

相似文献

本文报道了一种新的方法来建立甚高频(VHF)硅纳米机电(NEM)谐振器的非线性谐振行为的模型,通过1-ω混合谐振测量。对1.5 μ m长梁的实验数据进行了系统的拟合,解释了固有的力学非线性和非线性电压调谐效应。非线性共振振荡的非对称线型和迟滞起始点得到了很好的证明,且拟合误差较小。纳米级谐振器器件的建模方法,其中包括非线性响应的发展是有益的无缝技术转移从单个设备到集成系统在未来。
This paper reports a novel method to build a model for nonlinear resonance behaviour of very-high-frequency (VHF) silicon nanoelectromechanical (NEM) resonators, measured via 1-ω mixing resonance measurements. Systematic fitting results for the experimental data of a 1.5-μ m-long beams have been achieved with explicit explanation of the amount of intrinsic mechanical nonlinearity and nonlinear voltage-tuning effect. Asymmetric line shape and onset of hysteresis on nonliner resonance behavour have been well demonstrated with less fitting errors. The development of a modelling method of nanoscale resonator devices which includes nonlinear response is beneficial for seamless technology transfer from individual devices to integrated systems in the future.
将纳米机电 (NEM) 继电器与具有功能 CMOS-NEM 电路的硅 CMOS 集成
DOI: 10.1109/iedm.2011.6131645
发表时间: 2011
期刊: 2011 International Electron Devices Meeting
影响因子: --
作者:
S. Chong;Byoungil Lee;K. B. Parizi;J. Provine;S. Mitra;R. Howe;H. Wong
通讯作者: H. Wong
DOI: 10.1016/j.ijnonlinmec.2019.07.002
发表时间: 2019-11-01
影响因子: 3.2
作者:
Frangi, Attilio;Gobat, Giorgio
通讯作者: Gobat, Giorgio
DOI: 10.1038/s41598-021-95793-y
发表时间: 2021-08-12
期刊: Scientific reports
影响因子: 4.6
作者:
Gobat G;Zega V;Fedeli P;Guerinoni L;Touzé C;Frangi A
通讯作者: Frangi A
DOI: 10.3390/s17040779
发表时间: 2017-04-06
期刊: Sensors (Basel, Switzerland)
影响因子: --
作者:
Frangi A;Guerrieri A;Boni N
通讯作者: Boni N
DOI: 10.1371/journal.pone.0178663
发表时间: 2017
期刊: PloS one
影响因子: 3.7
作者:
Coulombe JC;York MCA;Sylvestre J
通讯作者: Sylvestre J