Electron-irradiated n+-Si as hole injection tunable anode of organic light-emitting diode
Electron-irradiated n+-Si as hole injection tunable anode of organic light-emitting diode
复制标题
电子辐照n-Si作为有机发光二极管空穴注入可调阳极
DOI:
10.1007/s00340-012-5255-7
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发表时间:
2013
期刊:
影响因子:
--
通讯作者:
H. Luo
中科院分区:
文献类型:
--
作者:
Y. Z. Li;Z. L. Wang;Y. Z. Wang;H. Luo
Traditionally, n-type silicon is not regarded as a good anode of organic light emitting diode (OLED) due to the extremely low hole concentration in it; however, when doped with Au element which acts as carrier generation centers, it can be, as shown in our previous work. In this study, we demonstrate a new kind of carrier generation centers in n+-type silicon, which are the defects produced by 5 MeV electron irradiation. The density of carrier generation centers in the irradiated n+-Si anode can be controlled by tuning the electron irradiation time, and thus hole injection current in the OLEDs with the irradiated n+-Si anode can be optimized, leading to their much higher maximum efficiencies than those of the OLEDs with non-irradiated n+-Si anode. For a green phosphorescent OLED with the irradiated n+-Si anode, the current efficiency and power efficiency reach up to 12.1 cd/A and 4.2 lm/W, respectively.
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