Crossover between weak antilocalization and weak localization of bulk states in ultrathin Bi₂Se₃ films.
Crossover between weak antilocalization and weak localization of bulk states in ultrathin Bi₂Se₃ films.
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超薄 Bi2Se3 薄膜中体态弱反局域化与弱局域化的交叉
DOI:
10.1038/srep05817
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发表时间:
2014-07-24
影响因子:
4.6
通讯作者:
Wang J
中科院分区:
文献类型:
--
作者:
Wang H;Liu H;Chang CZ;Zuo H;Zhao Y;Sun Y;Xia Z;He K;Ma X;Xie XC;Xue QK;Wang J
We report transport studies on the 5 nm thick Bi₂Se₃ topological insulator films which are grown via molecular beam epitaxy technique. The angle-resolved photoemission spectroscopy data show that the Fermi level of the system lies in the bulk conduction band above the Dirac point, suggesting important contribution of bulk states to the transport results. In particular, the crossover from weak antilocalization to weak localization in the bulk states is observed in the parallel magnetic field measurements up to 50 Tesla. The measured magneto-resistance exhibits interesting anisotropy with respect to the orientation of parallel magnetic field B// and the current I, signifying intrinsic spin-orbit coupling in the Bi₂Se₃ films. Our work directly shows the crossover of quantum interference effect in the bulk states from weak antilocalization to weak localization. It presents an important step toward a better understanding of the existing three-dimensional topological insulators and the potential applications of nano-scale topological insulator devices.
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影响因子:
4
作者:
He, Hongtao;Li, Baikui;Wang, Jiannong
通讯作者:
Wang, Jiannong
影响因子:
4.6
作者:
Tian J;Chang C;Cao H;He K;Ma X;Xue Q;Chen YP
通讯作者:
Chen YP
影响因子:
8.6
作者:
Lu, Hai-Zhou;Shi, Junren;Shen, Shun-Qing
通讯作者:
Shen, Shun-Qing
影响因子:
4
作者:
Assaf, B. A.;Cardinal, T.;Heiman, D.
通讯作者:
Heiman, D.
影响因子:
8.6
作者:
Chen, J.;Qin, H. J.;Lu, L.
通讯作者:
Lu, L.