Effect of surface carbon contamination on the chemical states of N-doped ZnO thin films
Effect of surface carbon contamination on the chemical states of N-doped ZnO thin films
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表面碳污染对N掺杂ZnO薄膜化学态的影响
DOI：
10.1007/s00339-018-1565-x
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发表时间：
2018-01
期刊：
影响因子：
--
通讯作者：
Chunyang Kong
中科院分区：
文献类型：
--
作者：
Hong Zhang;Wanjun Li;Guoping Qin;Liang Fang;Haibo Ruan;Mi Tan;Fang Wu;Chunyang Kong
Nitrogen-doped ZnO thin films [ZnO:N] and intentional surface carbon-contaminated ZnO:N thin films [ZnO:N@C] were grown on quartz substrates by radio frequency magnetron sputtering deposition method. The structural, electrical and optical properties as well as chemical states of elements were investigated by means of X-ray diffraction (XRD), Hall effect measurement (Hall), UV–Vis–Near infrared spectrophotometer and X-ray photoelectron spectroscopy (XPS). The results indicate that surface carbon contamination almost does not affect the band gap of ZnO:N thin films but has a strong impact on the crystal quality of ZnO:N thin film surface and results in a significant increase in tensile stress. The XPS analysis shows that the effect of surface carbon contamination treatment on the chemical states of ZnO:N thin films is remarkable. Because the stability of Zn–N bonds in N-rich local environments is nowhere near that of those in O-rich local environments, the N atoms in N-rich local environments easily bond with surface carbon atoms to form undesirable C–N bonds, thus resulting in a decrease of NOacceptors in N-rich local environments. Obviously, it is unfavorable to subsequently prepare high stability of N-doped p-type ZnO thin films.
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影响因子：
3.2
作者：
Jinsu Zhang;Lide Zhang;L. Zhu;Yuzhi Zhang;Meilin Liu;Xuefei Wang;G. He
通讯作者：
Jinsu Zhang;Lide Zhang;L. Zhu;Yuzhi Zhang;Meilin Liu;Xuefei Wang;G. He
影响因子：
6.2
作者：
A. Rakhshani
通讯作者：
A. Rakhshani
影响因子：
4
作者：
Xiaonan Li;B. Keyes;S. Asher;S. Zhang;S. Wei;T. Coutts;S. Limpijumnong;C. Walle
通讯作者：
Xiaonan Li;B. Keyes;S. Asher;S. Zhang;S. Wei;T. Coutts;S. Limpijumnong;C. Walle
影响因子：
41.2
作者：
Tsukazaki, A;Ohtomo, A;Kawasaki, M
通讯作者：
Kawasaki, M
影响因子：
4.6
作者：
Parmar NS;Yim H;Choi JW
通讯作者：
Choi JW