Optimizing strontium ruthenate thin films for near-infrared plasmonic applications.
Optimizing strontium ruthenate thin films for near-infrared plasmonic applications.
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DOI：
10.1038/srep09118
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发表时间：
2015-03-13
影响因子：
4.6
通讯作者：
Petrov PK
中科院分区：
文献类型：
--
作者：
Braic L;Vasilantonakis N;Zou B;Maier SA;Alford NM;Zayats AV;Petrov PK
最近已经引入了几种新的等离子体材料，以便实现比常规等离子体金属更好的温度稳定性，并且通过在宽光谱范围内选择等离子体频率来控制场局部化。在这里，外延SrRuO 3薄膜与低表面粗糙度的脉冲激光沉积制备的研究。氧沉积压力（20-300 mTorr）上的电荷载流子动力学和光学常数的薄膜在近红外光谱范围内的影响进行了阐述。结果表明，SrRuO 3薄膜在近红外波段表现出等离子体激元行为，等离子体频率在3.16-3.86 eV范围内，ε近零波长在1.11-1.47 μm范围内，可以通过沉积条件进行控制。 这些薄膜的可能应用范围从近红外光谱范围内的发热纳米结构到基于超材料的理想吸收体和ε近零组件，其中需要在给定光谱范围内介电常数的真实的和虚部之间的相互作用来优化光谱性能。
Several new plasmonic materials have recently been introduced in order to achieve better temperature stability than conventional plasmonic metals and control field localization with a choice of plasma frequencies in a wide spectral range. Here, epitaxial SrRuO3 thin films with low surface roughness fabricated by pulsed laser deposition are studied. The influence of the oxygen deposition pressure (20–300 mTorr) on the charge carrier dynamics and optical constants of the thin films in the near-infrared spectral range is elucidated. It is demonstrated that SrRuO3 thin films exhibit plasmonic behavior of the thin films in the near-infrared spectral range with the plasma frequency in 3.16–3.86 eV range and epsilon-near-zero wavelength in 1.11–1.47 μm range that could be controlled by the deposition conditions. The possible applications of these films range from the heat-generating nanostructures in the near-infrared spectral range, to metamaterial-based ideal absorbers and epsilon-near-zero components, where the interplay between real and imaginary parts of the permittivity in a given spectral range is needed for optimizing the spectral performance.
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影响因子：
3.7
作者：
Lee, JS;Lee, YS;Kanno, R
通讯作者：
Kanno, R
影响因子：
8.6
作者：
Puchkov, AV;Schabel, MC;Shen, ZX
通讯作者：
Shen, ZX
DOI：
10.1143/jjap.39.2110
发表时间：
2000-04-01
期刊：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
影响因子：
--
作者：
Morimoto, T;Hidaka, O;Tanaka, S
通讯作者：
Tanaka, S
影响因子：
4
作者：
EOM, CB;VANDOVER, RB;FORK, DK
通讯作者：
FORK, DK
影响因子：
3.7
作者：
Lee, YS;Yu, JJ;Eom, CB
通讯作者：
Eom, CB