Preliminary study of photomask pattern inspection by beam-shaped knife-edge interferometry
Preliminary study of photomask pattern inspection by beam-shaped knife-edge interferometry
复制标题
光束形刀口干涉光掩模图形检测初步研究
DOI：
10.1016/j.precisioneng.2022.05.011
复制
发表时间：
2022
期刊：
影响因子：
--
通讯作者：
Lee, ChaBum
中科院分区：
文献类型：
--
作者：
Wang, Zhikun;Lin, Pengfei;Lee, ChaBum
本文提出了一种光掩模检测与缺陷分析技术，可以准确测量光掩模的图案尺寸，方便、快速、可靠地检测出光掩模的缺陷。提出了光束形刀口干涉法（BSKEI），用于采集参考入射波与边缘绕射波在扫描掩模时叠加产生的干涉图。BSKEI由一个脉冲激光二极管、一个光圈、一个物镜和一个光纤耦合光电二极管组成。物镜使光束整形产生球面波作为新的光源，光束整形有效地提高了干涉图的空间频率。基于菲涅耳数模型对干涉图进行了表征，并建立了相应的干涉图分析方法。BSKEI在扫描光掩模时，根据光掩模的模式和缺陷产生不同的干涉图。因此，BSKEI能够测量光掩膜的图案宽度、开口宽度、线边质量和开口面积表面质量，并有望成为许多半导体应用中关键尺寸测量的替代工具。
This paper presents a photomask inspection and defect analysis technique to accurately measure the pattern dimensions and to detect the defects of the photomask in a convenient, fast, reliable manner. The beam-shaped knife-edge interferometry (BSKEI) was developed to collect the interferogram created by the superposition of the reference incident wave and the edge-diffracted wave while scanning the photomask. BSKEI consists of a pulsed laser diode, an aperture, an objective lens, and a fiber-coupled photodiode. The objective lens enabled the beam shaping to create a spherical wave as a new source of light, and the beam shaping was effective to enhance the spatial frequency of the interferogram. The interferograms were characterized based on a Fresnel number model, and the corresponding interferogram analysis methods were developed. BSKEI produced different interferograms according to the photomask patterns and defects while scanning the photomask. As a result, BSKEI is capable of the measurement of pattern width, opening width, line-edge quality, and opening area surface quality of the photomask, and is expected to be an alternative tool for critical dimension metrology in many semiconductor applications.
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