Structure, mechanical and tribological properties of Ti-doped amorphous carbon films simultaneously deposited by magnetron sputtering and pulse cathodic arc
Structure, mechanical and tribological properties of Ti-doped amorphous carbon films simultaneously deposited by magnetron sputtering and pulse cathodic arc
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磁控溅射和脉冲阴极电弧同时沉积掺钛非晶碳薄膜的结构、力学和摩擦学性能
DOI：
10.1016/j.diamond.2017.05.010
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发表时间：
2017-08
影响因子：
4.1
通讯作者：
Balmakou A.
中科院分区：
文献类型：
--
作者：
Ming Miao Yi;Piliptsou D. G.;Rudenkov A. S.;Rogachev A. V.;Jiang Xiaohong;Sun Dongping;Chaus A. S.;Balmakou A.
本文研究了钛掺杂（a-C:Ti）修饰的非晶碳（a-C:Ti）薄膜的结构和摩擦学性能。采用脉冲阴极碳弧技术和直流磁控溅射同时制备了a-C:Ti薄膜。采用拉曼光谱、x射线光电子能谱、原子力显微镜和配备能量色散x射线能谱的扫描电镜（SEM）分析了a-C和a-C:Ti薄膜的结构和表面形貌。用“球平面”法研究了干滑动条件下薄膜的摩擦参数。在Ti掺杂的作用下，aC:Ti膜的摩擦系数从0.17增加到0.21，而a-C膜的摩擦系数为0.14。与a-C:Ti膜相比，a-C:Ti膜的counterbody磨损率降低了2.2-3.8倍，这是由于在Ti的作用下，a-C:Ti膜的相组成、表面形貌和显微硬度发生了变化。本工作的研究结果表明，通过掺杂最佳量的Ti，可以获得具有良好增强耐磨性的硬a-C:Ti薄膜。
In this paper, the structure as well as tribological properties of amorphous carbon (a-C) films modified by titanium doping (a-C:Ti) were examined. The a-C:Ti films were deposited by simultaneously using use of pulse cathodic carbon arc technique and with direct current Ti magnetron sputtering. Structure and surface morphology of the a-C and a-C:Ti films were analyzed by Raman spectroscopy, X-ray photoelectron spectroscopy, atomic force microscopy, and scanning electron microscopy (SEM) equipped with energy dispersive X-ray spectroscopy. Friction parameters of the films have been studied under the condition of dry sliding using a“sphere-plane” method. Under the effect of Ti doping, there was an increase in the friction coefficient of the aC:Ti films from 0.17 up to 0.21 vs. 0.14 for a-C film. In contrast, the counterbody wear rate was 2.2–3.8 times lower in the case of the a-C:Ti films compared with that of the a-C film, which is attributed to the changes in the a-C:Ti films with respect to their phase composition, surface morphology and microhardness under the action of Ti. The study results of this work show that it is possible to obtain hard a-C:Ti films with good enhanced wear resistance by doping an optimal amount of Ti.
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