Single-Nanowire Strain Sensors Fabricated by Nanoskiving.
Single-Nanowire Strain Sensors Fabricated by Nanoskiving.
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纳米肯制造的单纳米线应变传感器。
DOI：
10.1016/j.sna.2017.07.046
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发表时间：
2017-08-15
期刊：
影响因子：
--
通讯作者：
Lipomi DJ
中科院分区：
文献类型：
--
作者：
Jibril L;Ramírez J;Zaretski AV;Lipomi DJ
本文描述了通过用超微切片机对金膜进行薄切片来制造单纳米线应变传感器，“纳米切削”将纳米线传感器从水浴转移到不同的基底上，在切片后它们漂浮在水浴上。研究了这些单根纳米线对机械应变的电响应，最低可检测应变确定为1.6 × 10−5，可重复响应应变高达7 × 10−4。传感器具有更高的灵敏度，平均应变系数为3.1，但在低应变区（ε ~ 1 × 10−5）高达9.5。与纳米线高度相同的传统金薄膜被用作对照，并且无法检测到这些相同的菌株。通过将单根纳米线转移到聚酰亚胺胶带上，并将传感器放置在手腕上以监测桡动脉的脉搏压力波形，研究了该传感器的实用性。这种纳米线的制造工具简单，不需要光刻。此外，传感器可以有效地“制造”，因为膜的每个连续部分都是先前纳米线的准副本。这些纳米线的简单制造，沿着与柔性衬底的兼容性，提供了可能性，在开发新的类型的设备，用于生物医学应用和结构健康监测。
This article describes the fabrication of single-nanowire strain sensors by thin sectioning of gold films with an ultramicrotome—i.e., “nanoskiving.” The nanowire sensors are transferred to various substrates from the water bath on which they float after sectioning. The electrical response of these single nanowires to mechanical strain is investigated, with the lowest detectable strain determined to be 1.6 × 10−5 with a repeatable response to strains as high as 7 × 10−4. The sensors are shown to have an enhanced sensitivity with a gauge factor of 3.1 on average, but as high as 9.5 in the low strain regime (ε ~ 1 × 10−5). Conventional thin films of gold of the same height as the nanowires are used as controls, and are unable to detect those same strains. The practicality of this sensor is investigated by transferring a single nanowire to polyimide tape, and placing the sensor on the wrist to monitor the pulse pressure waveform from the radial artery. The nanowires are fabricated with simple tools and require no lithography. Moreover, the sensors can be “manufactured” efficiently, as each consecutive section of the film is a quasi copy of the previous nanowire. The simple fabrication of these nanowires, along with the compatibility with flexible substrates, offers possibilities in developing new kinds of devices for biomedical applications and structural health monitoring.
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影响因子：
4.6
作者：
Cheng Z;Liu L;Xu S;Lu M;Wang X
通讯作者：
Wang X
影响因子：
17.1
作者：
Amjadi, Morteza;Pichitpajongkit, Aekachan;Park, Inkyu
通讯作者：
Park, Inkyu
DOI：
10.1116/1.578828
发表时间：
1994-05-01
期刊：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
影响因子：
--
作者：
LI, CS;HESKETH, PJ;MACLAY, GJ
通讯作者：
MACLAY, GJ
影响因子：
--
作者：
SMITH, CS
通讯作者：
SMITH, CS
影响因子：
29.4
作者：
Wirtz, M;Martin, CR
通讯作者：
Martin, CR