Energy Distribution of Secondary Particles in Ion Beam Deposition Process of Ag: Experiment, Calculation and Simulation

Energy Distribution of Secondary Particles in Ion Beam Deposition Process of Ag: Experiment, Calculation and Simulation
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Ag离子束沉积过程中二次粒子的能量分布:实验、计算和模拟

DOI:
10.1002/ctpp.201510015
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发表时间:
2015
影响因子:
1.6
通讯作者:
H. Neumann
H. Neumann
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
C. Bundesmann;R. Feder;T. Lautenschläger;H. Neumann

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离子束溅射沉积允许通过改变离子束(离子能量、离子种类)和几何参数(离子入射角、极性发射角)来定制成膜二次粒子(溅射靶粒子和背散射一次粒子)的性质,并因此定制薄膜性质。特别是,二次粒子的能量分布及其对离子束沉积过程中的银的影响进行了研究,在依赖于工艺参数。使用能量选择质谱法测量溅射和背散射离子的能量分布。溅射粒子的能量分布表明,根据理论,在低能量和E-2衰减的能量以上的最大值。如果入射角和极性发射角之和大于90°,则由于直接溅射事件而发生额外贡献。后向散射的初级粒子的能量分布可以通过在靶粒子和注入的初级粒子处的散射来显示贡献。这些贡献的发生再次强烈地依赖于散射几何形状,但也对初级离子物种。直接溅射和背散射粒子的能量是使用基于简单的两粒子相互作用的方程计算的,而能量分布是使用著名的蒙特卡罗程序TRIM. SP模拟的。原则上,计算和模拟数据与实验结果吻合得很好。(© 2015 WILEY‐VCH Verlag GmbH & Co. KGaA,魏因海姆)
Ion beam sputter deposition allows tailoring the properties of the film‐forming, secondary particles (sputtered target particles and backscattered primary particles) and, hence, thin film properties by changing ion beam (ion energy, ion species) and geometrical parameters (ion incidence angle, polar emission angle). In particular, the energy distribution of secondary particles and their influence on the ion beam deposition process of Ag was studied in dependence on process parameters. Energy‐selective mass spectrometry was used to measure the energy distribution of sputtered and backscattered ions. The energy distribution of the sputtered particles shows, in accordance with theory, a maximum at low energy and an E–2decay for energies above the maximum. If the sum of incidence angle and polar emission angle is larger than 90°, additional contributions due to direct sputtering events occur. The energy distribution of the backscattered primary particles can show contributions by scattering at target particles and at implanted primary particles. The occurrence of these contributions depends again strongly on the scattering geometry but also on the primary ion species. The energy of directly sputtered and backscattered particles was calculated using equations based on simple two‐particle‐interaction whereas the energy distribution was simulated using the well‐known Monte Carlo code TRIM.SP. In principal, the calculation and simulation data agree well with the experimental findings. (© 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
DOI: 10.1016/s0168-583x(01)00573-0
发表时间: 2001
影响因子: 1.3
作者:
A. Goehlich;D. Gillmann;H. Döbele
通讯作者: H. Döbele
DOI: 10.1016/s0168-583x(99)01106-4
发表时间: 2000
影响因子: 1.3
作者:
A. Goehlich;D. Gillmann;H. Döbele
通讯作者: H. Döbele
离子束溅射中的粒子能量和角度分布
DOI: 10.1016/s0257-8972(97)00304-6
发表时间: 1997
影响因子: 5.4
作者:
E. Franke;H. Neumann;M. Zeuner;W. Frank;F. Bigl
通讯作者: F. Bigl
影响因子: 1.3
作者:
René Feder;C. Bundesmann;H. Neumann;B. Rauschenbach
通讯作者: B. Rauschenbach
激光诱导荧光光谱研究物理溅射中的各向异性效应
DOI: 10.1103/physrevb.62.9349
发表时间: 2000
期刊: Physical Review B
影响因子: 3.7
作者:
A. Goehlich;N. Niemoeller;H. Döbele
通讯作者: H. Döbele