Theoretical Investigations of the Reactions of N- and O-Containing Species on a C(100):H 2 × 1 Reconstructed Diamond Surface.
Theoretical Investigations of the Reactions of N- and O-Containing Species on a C(100):H 2 × 1 Reconstructed Diamond Surface.
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含 N 和 O 物质在 C(100):H 2 × 1 重构金刚石表面上反应的理论研究。
DOI:
10.1021/acs.jpca.7b00466
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发表时间:
2017
期刊:
影响因子:
--
通讯作者:
Kelly MW
中科院分区:
文献类型:
--
作者:
Kelly MW
Quantum mechanical and hybrid quantum mechanical/molecular mechanical cluster models were used to investigate possible reaction mechanisms whereby gas-phase NHx(x= 0–2), CNHx(x= 0, 1), and OH radicals can add to, and incorporate in, a C–C dimer bond on the C(100):H 2 × 1 diamond surface during chemical vapor deposition (CVD) from microwave-activated C/H containing gas mixtures containing trace amounts of added N or O. Three N incorporation routes are identified, initiated by N, NH, and CN(H) addition to a surface radical site, whereas only OH addition was considered as the precursor to O incorporation. Each is shown to proceed via a ring-opening/ring-closing reaction mechanism analogous to that identified previously for the case of CH3addition (and CH2incorporation) in diamond growth from a pure C/H plasma. On the basis of the relative abundances of N atoms and NH radicals close to the growing diamond surface, the former is identified as the more probable carrier of the N atoms appearing in CVD grown diamond, but fast H-shifting reactions postaddition encourage the view that NH is the more probable migrating and incorporating species. CN radical addition is deemed less probable but remains an intriguing prospect, since, if the ring-closed structure is reached, this mechanism has the effect of adding two heavy atoms, with the N atom sitting above the current growth layer and thus offering a potential nucleation site for next-layer growth.
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影响因子:
4
作者:
M. Lesik;J. Tetienne;A. Tallaire;J. Achard;V. Mille;A. Gicquel;Jean;Vincent Jacques
通讯作者:
Vincent Jacques
影响因子:
3.4
作者:
Harvey, JN
通讯作者:
Harvey, JN
影响因子:
4
作者:
J. Michl;T. Teraji;S. Zaiser;I. Jakobi;G. Waldherr;F. Dolde;P. Neumann;M. Doherty;N. Manson;J. Isoya;J. Wrachtrup
通讯作者:
J. Michl;T. Teraji;S. Zaiser;I. Jakobi;G. Waldherr;F. Dolde;P. Neumann;M. Doherty;N. Manson;J. Isoya;J. Wrachtrup
影响因子:
3.7
作者:
K. Larsson;J. Carlsson
通讯作者:
J. Carlsson
DOI:
10.1021/jp306191y
发表时间:
2012
期刊:
The journal of physical chemistry. A
影响因子:
--
作者:
Richley JC
通讯作者:
Richley JC