High-Voltage Polarization-Superjunction GaN HEMT With Built-In SBD for Low Reverse Conduction Loss
High-Voltage Polarization-Superjunction GaN HEMT With Built-In SBD for Low Reverse Conduction Loss
复制标题
具有内置 SBD 的高压极化超结 GaN HEMT,可实现低反向传导损耗
DOI:
10.1109/jeds.2022.3208731
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发表时间:
2022
影响因子:
2.3
通讯作者:
Xiaorong Luo
中科院分区:
文献类型:
--
作者:
Tao Sun;Kemeng Yang;Jie Wei;Yanjiang Jia;Siyu Deng;Zhijia Zhao;Bo Zhang;Xiaorong Luo
A GaN Reverse-Conducting HEMT (RC-HEMT) is proposed and fabricated on the GaN/AlGaN/GaN platform. It features an integrated Schottky barrier diode (SBD) to realize reverse conduction and the double-heterojunction to enhance breakdown voltage (BV). Compared with the inherent reverse conduction capability of the conventional HEMT (Con. HEMT), the built-in SBD exhibits a low reverse turn-on voltage (<inline-formula> <tex-math notation="LaTeX">$V_{\text{RT}}$ </tex-math></inline-formula>) and its <inline-formula> <tex-math notation="LaTeX">$V_{\text{RT}}$ </tex-math></inline-formula> is independent of the threshold voltage and gate bias. At the off-state, the fixed positive and negative polarization charges form the polarization superjunction (PSJ). Therefore, the depletion region is extended and more uniform E-field distribution is obtained. Experimental results show that the RC-PSJ-HEMT achieves a low <inline-formula> <tex-math notation="LaTeX">$V_{\text{RT}}$ </tex-math></inline-formula> of 0.68 V, which decreases 69.1% compared with that of the Con. HEMT. The BV of the RC-PSJ-HEMT (with <inline-formula> <tex-math notation="LaTeX">$7.5 \mu \text{m}$ </tex-math></inline-formula> <inline-formula> <tex-math notation="LaTeX">$V_{\text{GD}}$ </tex-math></inline-formula>) is increased to 723 V from 202 V of the Con. HEMT.
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影响因子:
--
作者:
Sun Tao;Luo Xiaorong;Wei Jie;Yang Chao;Zhang Bo
通讯作者:
Zhang Bo
DOI:
10.1109/iedm.2017.8268456
发表时间:
2017-12
期刊:
2017 IEEE International Electron Devices Meeting (IEDM)
影响因子:
--
作者:
Jiacheng Lei;Jin Wei;Gaofei Tang;Qingkai Qian;M. Hua;Zhaofu Zhang;Zheyang Zheng;K. J. Chen
通讯作者:
Jiacheng Lei;Jin Wei;Gaofei Tang;Qingkai Qian;M. Hua;Zhaofu Zhang;Zheyang Zheng;K. J. Chen
影响因子:
3.1
作者:
Jin Wei;Li Zhang;Zheyang Zheng;Wenjie Song;Song Yang;K. J. Chen
通讯作者:
Jin Wei;Li Zhang;Zheyang Zheng;Wenjie Song;Song Yang;K. J. Chen
影响因子:
4.9
作者:
Xing, HL;Dora, Y;Mishra, UK
通讯作者:
Mishra, UK
DOI:
10.1109/ispsd.2009.5158056
发表时间:
2009-06
期刊:
2009 21st International Symposium on Power Semiconductor Devices & IC's
影响因子:
--
作者:
K. Tang;Z. Li;T. Chow;Y. Niiyama;T. Nomura;S. Yoshida
通讯作者:
K. Tang;Z. Li;T. Chow;Y. Niiyama;T. Nomura;S. Yoshida