Thinking Small: Progress on Microscale Neurostimulation Technology.
Thinking Small: Progress on Microscale Neurostimulation Technology.
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DOI:
10.1111/ner.12716
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发表时间:
2017-12
期刊:
影响因子:
--
通讯作者:
Cogan SF
中科院分区:
文献类型:
--
作者:
Pancrazio JJ;Deku F;Ghazavi A;Stiller AM;Rihani R;Frewin CL;Varner VD;Gardner TJ;Cogan SF
Neural stimulation is well-accepted as an effective therapy for a wide range of neurological disorders. While the scale of clinical devices is relatively large, translational and pilot clinical applications are underway for microelectrode-based systems. Microelectrodes have the advantage of stimulating a relatively small tissue volume which may improve selectivity of therapeutic stimuli. Current microelectrode technology is associated with chronic tissue response which limits utility of these devices for neural recording and stimulation. One approach for addressing the tissue response problem may be to reduce physical dimensions of the device. “Thinking small” is a trend for the electronics industry, and for implantable neural interfaces, the result may be a device that can evade the foreign body response. This review paper surveys our current understanding pertaining to the relationship between implant size and tissue response and the state-of-the-art in ultra-small microelectrodes. A comprehensive literature search was performed using PubMed, Web of Science (Clarivate Analytics), and Google Scholar. The literature review shows recent efforts to create microelectrodes that are extremely thin appear to reduce or even eliminate the chronic tissue response. With high charge capacity coatings, ultra-microelectrodes fabricated from emerging polymers and amorphous silicon carbide appear promising for neurostimulation applications. We envision the emergence of robust and manufacturable ultra-microelectrodes that leverage advanced materials where the small cross-sectional geometry enables compliance within tissue. Nevertheless, future testing under in vivo conditions is particularly important for assessing the stability of thin film devices under chronic stimulation.
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DOI:
10.1002/jbm.b.31223
发表时间:
2009-05
期刊:
Journal of biomedical materials research. Part B, Applied biomaterials
影响因子:
--
作者:
Cogan SF;Ehrlich J;Plante TD;Smirnov A;Shire DB;Gingerich M;Rizzo JF
通讯作者:
Rizzo JF
影响因子:
4.9
作者:
Cogan, SF;Edell, DJ;Edell, R
通讯作者:
Edell, R
影响因子:
4.2
作者:
Frost, Shawn B.;Dunham, Caleb L.;Nudo, Randolph J.
通讯作者:
Nudo, Randolph J.
影响因子:
9.9
作者:
Contarino, M. Fiorella;Bour, Lo J.;Schuurman, P. R.
通讯作者:
Schuurman, P. R.
影响因子:
4
作者:
Davis, T. S.;Wark, H. A. C.;Greger, B.
通讯作者:
Greger, B.