Remarkable reduction in the threshold voltage of pentacene-based thin film transistors with pentacene/CuPc sandwich configuration

Remarkable reduction in the threshold voltage of pentacene-based thin film transistors with pentacene/CuPc sandwich configuration
复制标题

并五苯/CuPc 夹层结构的并五苯基薄膜晶体管的阈值电压显着降低

DOI:
10.1063/1.4884175
复制
发表时间:
2014-06
期刊:
影响因子:
1.6
通讯作者:
Zheng Hu
Zheng Hu
中科院分区:
材料科学4区
文献类型:
--
作者:
Yun Li;Yi Shi;Xizhang Wang;Zheng Hu

文献摘要

参考文献

相似文献

研究了具有并五苯/铜(CuPc)夹心结构的并五苯基薄膜晶体管的阈值电压(VT)的显著降低。这种减少伴随着流动性的增加和亚门槛斜率的降低(S)。与传统的顶接触器件相比,镀有5 nm CuPc层的三明治器件的VT从−20.4V显著降低到−0.2V,迁移率从0.18cm2/vs增加到0.51cm2/vs,S从4.1V/dec降低到2.9V/dec。然而,通断电流比保持在105。这一增强的性能可以归因于所结合的CuPc层降低了电荷陷阱密度。结果表明,该方法简单有效地制备了高迁移率、低VT的并五苯基有机薄膜晶体管。
This study investigates the remarkable reduction in the threshold voltage (VT) of pentacene-based thin film transistors with pentacene/copper phthalocyanine (CuPc) sandwich configuration. This reduction is accompanied by increased mobility and lowered sub-threshold slope (S). Sandwich devices coated with a 5 nm layer of CuPc layer are compared with conventional top-contact devices, and results indicate that VT decreased significantly from −20.4 V to −0.2 V, that mobility increased from 0.18 cm2/Vs to 0.51 cm2/Vs, and that S was reduced from 4.1 V/dec to 2.9 V/dec. However, the on/off current ratio remains at 105. This enhanced performance could be attributed to the reduction in charge trap density by the incorporated CuPc layer. Results suggest that this method is simple and effectively generates pentacene-based organic thin film transistors with high mobility and low VT.
DOI: 10.1016/j.orgel.2013.02.001
发表时间: 2013-04
影响因子: 3.2
作者:
Rahim Abdur;K. Jeong;Mi Jung Lee;Jaegab Lee
通讯作者: Rahim Abdur;K. Jeong;Mi Jung Lee;Jaegab Lee
DOI: 10.1063/1.2535741
发表时间: 2007-02-12
影响因子: 4
作者:
Chen, Fang-Chung;Kung, Li-Jen;Lin, Yung-Sheng
通讯作者: Lin, Yung-Sheng
DOI: 10.1039/b905263a
发表时间: 2009-01-01
影响因子: --
作者:
Xu, Wentao;Rhee, Shi-Woo
通讯作者: Rhee, Shi-Woo
DOI: 10.1002/adma.201202789
发表时间: 2013-02-06
期刊: ADVANCED MATERIALS
影响因子: 29.4
作者:
Kim, Jong H.;Yun, Sun Woo;Park, Soo Young
通讯作者: Park, Soo Young
DOI: 10.1021/am1003377
发表时间: 2010-08-01
影响因子: 9.5
作者:
Liu, Shun-Wei;Lee, Chih-Chien;Chen, Chin-Ti
通讯作者: Chen, Chin-Ti