In-line measuring method for periodical sub-wavelength nanostructures
In-line measuring method for periodical sub-wavelength nanostructures
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周期性亚波长纳米结构的在线测量方法
DOI：
10.1117/12.2270333
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发表时间：
2017
期刊：
影响因子：
--
通讯作者：
A. Fischer
中科院分区：
文献类型：
--
作者：
G. Alexe;A. Tausendfreund;D. Stöbener;A. Fischer
这项工作的目标是描述一种模拟设计的散射测量方法，用于亚波长正弦光栅的在线表征，这些光栅是在卷对卷过程中形成的透明箔上。挑战在于获取工件的三维信息，即以nm精度测量光栅高度和光栅周期。光栅周期由一阶衍射峰在反射区和透射区的位置直接得到。为了确定光栅高度，解决了反问题，即从光散射模拟中提取衍射最大值散射强度与光栅高度之间的关系。在不同的仪器参数和仿真参数下，如探测和入射角、激光波长以及仿真输入参数，对测量不确定度进行了评估。结果表明，当使用可见光范围内的激光时，光栅周期和高度的测量不确定度分别为0.3 nm和≤8 nm。利用模拟得出的设置参数进行离线大面积扫描测量，验证了所提出的测量方法在识别空间表面特性局部变化方面的灵敏度。根据所选择的检测系统，采样率高达MHz范围是可行的，满足卷对卷生产过程的在线过程控制要求。
The goal of this work is to describe a simulatively designed scatterometry approach for the in-line characterization of sub-wavelength sinusoidal gratings, which are formed on a transparent foil in a roll-to-roll procedure. The challenge is to acquire the 3D information of the workpiece, i.e., to measure the grating height in addition to the grating period with nm precision. The grating period is obtained straightforward from the position of the first order diffraction maxima in the reflection and the transmission region. For determining the grating height, the inverse problem is solved, i.e., the relation between the scattered intensities of the diffraction maxima and the grating height is extracted from light scattering simulations. The measurement uncertainty is evaluated for different instrumentation and simulation parameters, such as the detection and incidence angle, the laser wavelength as well as the input parameters of the simulation. As a result, the measurement uncertainty for the grating period and the height is estimated to 0.3 nm and ≤8 nm, respectively, when using laser light in the visible wavelength range. Large area scanning measurements performed offline using the setup parameters derived from simulations verify the sensitivity of the presented measurement approach for identifying local variations of the spatial surface properties. Depending on the chosen detection system, sampling rates up to the MHz range are feasible meeting the requirements of in-line process control of the roll-to-roll production procedure.
通过分析相干光获得的图像进行表面表征和缺陷检测
DOI：
--
发表时间：
1991
期刊：
影响因子：
--
作者：
P. Lonardo;A. Bruzzone;C. Gambaro;F. Parizzi
通讯作者：
F. Parizzi
亚微米微电子学尺寸计量：扫描电子显微镜
影响因子：
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作者：
M. Postek;D. Joy
通讯作者：
D. Joy
化学放大抗蚀剂中潜像形貌的扫描力显微镜测量
DOI：
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发表时间：
1996
期刊：
影响因子：
--
作者：
L. Ocola;D. Fryer;G. Reynolds;A. Krasnoperova;F. Cerrina
通讯作者：
F. Cerrina