Coupling of Erbium-Implanted Silicon to a Superconducting Resonator

Coupling of Erbium-Implanted Silicon to a Superconducting Resonator
复制标题

注入铒的硅与超导谐振器的耦合

DOI:
10.1103/physrevapplied.16.034006
复制
发表时间:
2021
影响因子:
4.6
通讯作者:
Hughes M
Hughes M
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
Hughes M

文献摘要

参考文献

相似文献

掺铒硅在光子和量子技术平台上都很有希望,因为它同时具有电信和集成电路处理兼容性。然而,在注入和退火过程中会产生几个不同的中心,这些中心的存在可能会阻碍这些应用的发展。当离子与氙离子共注入,并采用适当的退火工艺时,其中一个浓度较高的中心可以被消除。样品的表征受到标准电子顺磁共振(EPR)仪器灵敏度的限制。在20MK下,超导集总元件谐振器和注入样品之间的集体耦合强度约为1 MHz,这为低浓度注入的表征和未来通过电信网络交换量子信息的混合量子系统网络提供了基础。在六个已知的相关EPR中心中,只有一个三角中心耦合到SC谐振器。
Erbium-implanted silicon is promising for both photonic and quantum-technology platforms, since it possesses both telecommunications and integrated-circuit processing compatibility. However, several differentcenters are generated during the implantation and annealing process, the presence of which could hinder the development of these applications. Whenis coimplanted withandions, and the appropriate annealing process is used, one of these centers, which is present at higherconcentrations, can be eliminated. Characterization of samples withconcentrations of <is limited by the sensitivity of standard electron paramagnetic resonance (EPR) instruments. The collective coupling strength between a superconducting (SC)lumped-element resonator and a-implantedsample at 20 mK is measured to be about 1 MHz, which provides a basis for the characterization of low-concentration-implantedand for future networks of hybrid quantum systems that exchange quantum information over the telecommunication network. Of six known-related EPR centers, only one trigonal center couples to the SC resonator.
晶体硅中铒相关光学活性中心的微观结构。
DOI: 10.1103/physrevlett.90.066401
发表时间: 2003
影响因子: 8.6
作者:
N. Vinh;H. Przybylińska;Z. F. Krasil’nik;T. Gregorkiewicz
通讯作者: T. Gregorkiewicz
Si中Er-杂质配合物的电子顺磁共振和光致发光研究
DOI: 10.1103/physrevb.59.2773
发表时间: 1999
期刊: Physical Review B
影响因子: 3.7
作者:
J. D. Carey;R. Barklie;J. Donegan;F. Priolo;G. Franzò;S. Coffa
通讯作者: S. Coffa
来自注入铒的硅的自旋回波
DOI: 10.1063/5.0046904
发表时间: 2021
影响因子: 4
作者:
Hughes M
通讯作者: Hughes M
DOI: 10.1103/physrevapplied.11.054082
发表时间: 2019-05
影响因子: 4.6
作者:
Gavin Dold;C. Zollitsch;James O'Sullivan;S. Welinski;A. Ferrier;P. Goldner;S. D. Graaf;T. Lindström;J. Morton
通讯作者: Gavin Dold;C. Zollitsch;James O'Sullivan;S. Welinski;A. Ferrier;P. Goldner;S. D. Graaf;T. Lindström;J. Morton
超导谐振器中的慢噪声过程
DOI: 10.1103/physrevb.87.140501
发表时间: 2013
期刊: Physical Review B
影响因子: 3.7
作者:
Burnett J
通讯作者: Burnett J