Direct LED writing of submicron resist patterns: Towards the fabrication of individually-addressable InGaN submicron stripe-shaped LED arrays
Direct LED writing of submicron resist patterns: Towards the fabrication of individually-addressable InGaN submicron stripe-shaped LED arrays
复制标题
亚微米光刻胶图案的直接 LED 写入:面向制造可单独寻址的 InGaN 亚微米条形 LED 阵列
DOI:
10.1007/s12274-014-0545-5
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发表时间:
2014
期刊:
影响因子:
9.9
通讯作者:
Gong Z
中科院分区:
文献类型:
--
作者:
Gong Z
Submicron stripe-shaped InGaN light-emitting diode (LED) arrays with individually addressable capabilities are demonstrated. The critical submicronstripe metallic electrodes, which define the emission pattern, are formed by direct LED writing in a mask-free manner. The individually addressable submicron-stripe LEDs show excellent performance in terms of their electrical characteristics (with typical turn-on voltage of 3 V, operational stability and power output up to 28 μW at 3 mA). Unlike conventional broad-sized LEDs, the efficiency droop of the submicron-stripe LED is significantly suppressed-in fact, there is no efficiency droop for current densities up to 100 A/cm2. Furthermore, the submicron-stripe LED shows a lower temperature-dependent shift of the emission wavelength. The lateral emission width is increased with increasing injection current, resulting in a wider lateral emission size than the metallic submicron-stripe electrode. The underlying physics of these phenomena are analysed. Such submicron-stripe LED arrays open up promising applications in nanophotonics and bio-sensing.
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影响因子:
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通讯作者:
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影响因子:
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