Magnetic anisotropy of Fe films deposited by dc magnetron sputtering under an external magnetic field
Magnetic anisotropy of Fe films deposited by dc magnetron sputtering under an external magnetic field
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外磁场下直流磁控溅射Fe薄膜的磁各向异性
DOI：
10.1007/s11434-015-0830-z
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发表时间：
2015-06
期刊：
影响因子：
18.9
通讯作者：
Nan Ce-Wen
中科院分区：
文献类型：
--
作者：
Chen Jiahui;Ma Jing;Wu Liang;Shen Yang;Nan Ce-Wen
采用直流磁控溅射法在MgO（001）和（011）单晶衬底上制备了磁性Fe薄膜。实验结果表明，在淀积过程中施加约300 Oe的外磁场，在MgO（001）衬底上产生了4倍立方磁各向异性，在MgO（011）衬底上产生了2倍单轴磁各向异性，而未施加外磁场时Fe薄膜的磁化强度为各向同性。研究结果表明，在制备过程中施加外加磁场可以有效地诱导溅射Fe原子的表面迁移率，进一步促进Fe薄膜的晶化和磁各向异性的增强。
Magnetic Fe films grown on single-crystal MgO (001) and (011) substrates were prepared by direct current magnetron sputtering. The experimental results showed that by applying an external magnetic field of about 300 Oe to film during deposition, a fourfold cubic magnetic anisotropy on MgO (001) substrate and a twofold uniaxial magnetic anisotropy on MgO (011) substrate were generated, compared to the isotropic magnetization of Fe film grown without applying the external magnetic field. Our results suggested that external magnetic field during preparation effectively induced relatively higher surface mobility of sputtered Fe atoms and further promoted the crystallization of Fe film and the enhancement of magnetic anisotropy.
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影响因子：
3.3
作者：
Xiaoli Tang;Huaiwu Zhang;Hua Su;Z. Zhong;Y. Jing
通讯作者：
Xiaoli Tang;Huaiwu Zhang;Hua Su;Z. Zhong;Y. Jing
影响因子：
2.7
作者：
Jun Woo Choi;Hyung-jun Kim;Kyungho Kim;A. Scholl;Joonyeon Chang
通讯作者：
Jun Woo Choi;Hyung-jun Kim;Kyungho Kim;A. Scholl;Joonyeon Chang
影响因子：
3.7
作者：
GORYUNOV, YV;GARIFYANOV, NN;ZABEL, H
通讯作者：
ZABEL, H
DOI：
10.1116/1.579410
发表时间：
1995-03
期刊：
Journal of Vacuum Science and Technology
影响因子：
--
作者：
J. Mattson;E. Fullerton;C. H. Sowers;S. Bader
通讯作者：
J. Mattson;E. Fullerton;C. H. Sowers;S. Bader
影响因子：
2.7
作者：
M. Zölfl;M. Brockmann;M. Köhler;S. Kreuzer;T. Schweinböck;S. Miethaner;F. Bensch;G. Bayreuther
通讯作者：
M. Zölfl;M. Brockmann;M. Köhler;S. Kreuzer;T. Schweinböck;S. Miethaner;F. Bensch;G. Bayreuther