Effect of hydrogen flow on the properties of hydrogenated amorphous carbon films fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition
Effect of hydrogen flow on the properties of hydrogenated amorphous carbon films fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition
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氢气流量对电子回旋共振等离子体增强化学气相沉积氢化非晶碳薄膜性能的影响
DOI：
10.1016/j.surfcoat.2011.03.107
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发表时间：
2011-11
影响因子：
5.4
通讯作者：
Huang, Nan
中科院分区：
文献类型：
--
作者：
Dong, X.;Deng, X.R.;Sun, H.;Leng, Y.X.;Huang, Nan
氢化非晶碳薄膜（a-C：H，又称类金刚石碳，DLC）具有优异的物理机械性能，具有广泛的应用前景。本文采用电子回旋共振化学气相沉积（ECR-CVD）方法，在不同的氢气流量下，在Si（100）衬底上沉积了非晶碳氢薄膜（a-C：H）。氢气流量从10 sccm变为40 sccm，乙炔流量固定在10 sccm。利用可见拉曼光谱、傅里叶变换红外光谱、紫外可见光谱、表面形貌仪和纳米压痕仪对a-C：H的微观结构和性能进行了表征。结果表明，随着氢气流量的增加，非晶碳氢薄膜中sp3含量和sp3-CH 2结构逐渐增加。沉积速率随氢气流量的增加而降低。随着氢气流量的增加，薄膜的残余应力和纳米硬度增加。随着氢气流量的增加，a-C：H薄膜的形貌变得更像金刚石。
The hydrogenated amorphous carbon films (a-C:H, so-called diamond-like carbon, DLC) have exceptional physical and mechanical properties and have wide applications. In the present study, amorphous hydrogenated carbon films (a-C:H) have been deposited on a Si (100) substrate at different hydrogen flow using electron cyclotron resonance chemical vapor deposition (ECR-CVD). The flow of hydrogen changed from 10sccm to 40sccm and the flow of acetylene was fixed at 10sccm. The microstructure and properties of the a-C:H were measured using visible Raman spectra, Fourier transform infrared (FTIR) spectroscopy, UV–VIS spectrometer,surface profilometer and nano-indentation. The results showed that the sp3content and sp3–CH2structure in the amorphous hydrogenated carbon films increased with the hydrogen flow. The deposition rate decreased with the hydrogen flow. The residual stress and the nano-hardness of the amorphous hydrogenated carbon films increased with the hydrogen flow. Consequently, the a-C:H film become more diamond-like with the increase of hydrogen flow.
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UHMWPE基材上a-C:H薄膜的沉积及其耐磨性能
影响因子：
6.7
作者：
Leng, Y. X.;Deng, Xingrui;Xie, Dong;Liu, Hengjun;Huang, Nan
通讯作者：
Huang, Nan
影响因子：
3
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影响因子：
5.4
作者：
MIYOSHI, K;WU, RLC;GARSCADDEN, A
通讯作者：
GARSCADDEN, A
影响因子：
3.7
作者：
NICKLOW, R;SMITH, HG;WAKABAYA.N
通讯作者：
WAKABAYA.N
影响因子：
3.5
作者：
T. V. Herak;R. McLeod;K. Kao;H. Card;H. Watanabe;K. Katoh;M. Yasui;Y. Shibata
通讯作者：
T. V. Herak;R. McLeod;K. Kao;H. Card;H. Watanabe;K. Katoh;M. Yasui;Y. Shibata