Phase resolved optical emission spectroscopy of coaxial microplasma jet operated with He and Ar
Phase resolved optical emission spectroscopy of coaxial microplasma jet operated with He and Ar
复制标题
氦气和氩气同轴微等离子体射流的相分辨发射光谱
DOI:
10.1140/epjd/e2010-00246-9
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发表时间:
2010
期刊:
影响因子:
--
通讯作者:
V. Schulz-von der Gathen
中科院分区:
文献类型:
--
作者:
J. Benedikt;S. Hofmann;N. Knake;H. Böttner;R. Reuter;A. von Keudell;V. Schulz-von der Gathen
Atmospheric pressure plasma jet sources are currently in the focus of many researchers for their promising applications in medical industry (e.g. treatment of living tissues), surface modification or material etching or synthesis. Here we report on the study of excitation mechanisms of a coaxial microplasma jet with a hollow capillary as an inner electrode and a ceramic tube with metal ring as outer electrode. This microplasma jet is operated in He and Ar gas and it is investigated by means of electrical measurements, optical emission spectroscopy and space and phase resolved wavelength integrated optical spectroscopy. Measurements of a microscale atmospheric pressure plasma jet with parallel metal electrodes operated in He are shown for comparison as well. Four different modes are distinguished with He as plasma forming gas. Theαdischarge in annular space between the electrodes, observed at low applied voltages, is very similar to the discharge in the jet with parallel electrodes. As the voltage increases aγdischarge appears, first localized at the tip of the capillary. As the voltage increases further theγdischarge appears in the annular space as well. A hollow cathode plasma is observed at any voltage used on the symmetry axis of the jet. Only one mode of plasma operation is observed in argon gas with distinctively different behavior. We hypothesize that it is comparable to a single microdischarge of a filamentary dielectric barrier discharge.
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影响因子:
2.2
作者:
J. Schäfer;R. Foest;A. Ohl;K. Weltmann
通讯作者:
J. Schäfer;R. Foest;A. Ohl;K. Weltmann
DOI:
10.1088/0022-3727/38/11/002
发表时间:
2005
期刊:
Journal of Physics D: Applied Physics
影响因子:
--
作者:
J. G. Eden;S. Park;N. Ostrom;K. Chen
通讯作者:
K. Chen
影响因子:
3.2
作者:
T. Ichiki;Ryo Taura;Y. Horiike
通讯作者:
T. Ichiki;Ryo Taura;Y. Horiike
DOI:
--
发表时间:
2003
期刊:
J. Phys. D : Appl. Phys. 36
影响因子:
--
作者:
Oroguchi;T.;C. Y. Li;K. Ishii;Y. Shimizu
通讯作者:
Y. Shimizu
影响因子:
4
作者:
L. Schaper;S. Reuter;J. Waskoenig;K. Niemi;V. D. Gathen;T. Gans
通讯作者:
T. Gans