Direct transformation of amorphous silicon carbide into graphene under low temperature and ambient pressure.
Direct transformation of amorphous silicon carbide into graphene under low temperature and ambient pressure.
复制标题
低温常压下非晶碳化硅直接转化为石墨烯
DOI:
10.1038/srep01148
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发表时间:
2013
影响因子:
4.6
通讯作者:
Mu, Shichun
中科院分区:
文献类型:
--
作者:
Peng, Tao;Lv, Haifeng;He, Daping;Pan, Mu;Mu, Shichun
A large-scale availability of the graphene is critical to the successful application of graphene-based electronic devices. The growth of epitaxial graphene (EG) on insulating silicon carbide (SiC) surfaces has opened a new promising route for large-scale high-quality graphene production. However, two key obstacles to epitaxial growth are extremely high requirements for almost perfectly ordered crystal SiC and harsh process conditions. Here, we report that the amorphous SiC (a-Si1−xCx) nano-shell (nano-film) can be directly transformed into graphene by using chlorination method under very mild reaction conditions of relative low temperature (800°C) and the ambient pressure in chlorine (Cl2) atmosphere. Therefore, our finding, the direct transformation of a-Si1−xCx into graphene under much milder condition, will open a door to apply this new method to the large-scale production of graphene at low costs.
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影响因子:
10.9
作者:
Juang, Zhen-Yu;Wu, Chih-Yu;Tsai, Chuen-Horng
通讯作者:
Tsai, Chuen-Horng
DOI:
10.1080/13642818408238875
发表时间:
1984-01-01
期刊:
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES
影响因子:
--
作者:
MORIMOTO, A;KATAOKA, T;SHIMIZU, T
通讯作者:
SHIMIZU, T
影响因子:
3.7
作者:
Emtsev, K. V.;Speck, F.;Riley, J. D.
通讯作者:
Riley, J. D.
影响因子:
41.2
作者:
Emtsev, Konstantin V.;Bostwick, Aaron;Seyller, Thomas
通讯作者:
Seyller, Thomas
影响因子:
3.7
作者:
Ferrari, AC;Robertson, J
通讯作者:
Robertson, J