Direct transformation of amorphous silicon carbide into graphene under low temperature and ambient pressure.

Direct transformation of amorphous silicon carbide into graphene under low temperature and ambient pressure.
复制标题

低温常压下非晶碳化硅直接转化为石墨烯

DOI:
10.1038/srep01148
复制
发表时间:
2013
期刊:
影响因子:
4.6
通讯作者:
Mu, Shichun
Mu, Shichun
中科院分区:
综合性期刊3区
文献类型:
--
作者:
Peng, Tao;Lv, Haifeng;He, Daping;Pan, Mu;Mu, Shichun

文献摘要

参考文献

被引文献

相似文献

石墨烯的大规模可用性对于石墨烯基电子器件的成功应用至关重要。在绝缘碳化硅(SiC)表面生长外延石墨烯(EG)为大规模生产高质量石墨烯开辟了一条新的有前途的途径。然而,外延生长的两个关键障碍是对几乎完全有序的SiC晶体的极高要求和苛刻的工艺条件。本文报道了在相对较低温度(800℃)和氯(Cl2)气氛的环境压力下,采用氯化法制备无定形SiC (a-Si1−xCx)纳米壳(纳米膜)可直接转化为石墨烯。因此,我们的发现,在更温和的条件下将a- si1−xCx直接转化为石墨烯,将为将这种新方法应用于低成本大规模生产石墨烯打开大门。
A large-scale availability of the graphene is critical to the successful application of graphene-based electronic devices. The growth of epitaxial graphene (EG) on insulating silicon carbide (SiC) surfaces has opened a new promising route for large-scale high-quality graphene production. However, two key obstacles to epitaxial growth are extremely high requirements for almost perfectly ordered crystal SiC and harsh process conditions. Here, we report that the amorphous SiC (a-Si1−xCx) nano-shell (nano-film) can be directly transformed into graphene by using chlorination method under very mild reaction conditions of relative low temperature (800°C) and the ambient pressure in chlorine (Cl2) atmosphere. Therefore, our finding, the direct transformation of a-Si1−xCx into graphene under much milder condition, will open a door to apply this new method to the large-scale production of graphene at low costs.
DOI: 10.1016/j.carbon.2009.03.051
发表时间: 2009-07-01
期刊: CARBON
影响因子: 10.9
作者:
Juang, Zhen-Yu;Wu, Chih-Yu;Tsai, Chuen-Horng
通讯作者: Tsai, Chuen-Horng
DOI: 10.1080/13642818408238875
发表时间: 1984-01-01
期刊: PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES
影响因子: --
作者:
MORIMOTO, A;KATAOKA, T;SHIMIZU, T
通讯作者: SHIMIZU, T
DOI: 10.1103/physrevb.77.155303
发表时间: 2008-04-01
期刊: PHYSICAL REVIEW B
影响因子: 3.7
作者:
Emtsev, K. V.;Speck, F.;Riley, J. D.
通讯作者: Riley, J. D.
DOI: 10.1038/nmat2382
发表时间: 2009-03-01
期刊: NATURE MATERIALS
影响因子: 41.2
作者:
Emtsev, Konstantin V.;Bostwick, Aaron;Seyller, Thomas
通讯作者: Seyller, Thomas
DOI: 10.1103/physrevb.61.14095
发表时间: 2000-05-15
期刊: PHYSICAL REVIEW B
影响因子: 3.7
作者:
Ferrari, AC;Robertson, J
通讯作者: Robertson, J