Influence of Al/Cu thickness ratio and deposition sequence on photoelectric property of ZnO/Al/Cu/ZnO multilayer film on PET substrate prepared by RF magnetron sputtering
Influence of Al/Cu thickness ratio and deposition sequence on photoelectric property of ZnO/Al/Cu/ZnO multilayer film on PET substrate prepared by RF magnetron sputtering
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Al/Cu厚度比和沉积顺序对射频磁控溅射PET基片上ZnO/Al/Cu/ZnO多层薄膜光电性能的影响
DOI：
10.1016/j.mssp.2018.11.013
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发表时间：
2019-03
影响因子：
4.1
通讯作者：
Huang Li
中科院分区：
文献类型：
--
作者：
Tian-yu Wang;Bao-jia Li;Nai-fei Ren;Li-jing Huang;Huang Li
采用射频磁控溅射法在柔性聚对苯二甲酸乙二醇酯（PET）衬底上制备了ZnO/Al/Cu/ZnO多层膜。中间Al和Cu金属层的总厚度保持在8 nm。四种不同的Al/Cu厚度比为7：1、6：2、5：3和4：4。通过使用相同的工艺制备另外四个参考样品，即ZnO单层膜、ZnO/Al 8（8-nm厚的Al层，以下相同）/ZnO、ZnO/Cu 8/ZnO和ZnO/Cu 2/Al 6/ZnO多层膜。研究了Al/Cu厚度比和Al层和Cu层沉积顺序的影响。结果表明，随着Cu层厚度的增加，多层膜的方块电阻减小，而透过率先增大后减小。ZnO/Al 6/Cu 2/ZnO多层膜的方块电阻为108 Ω/sq，平均可见光透过率为84.73%，最高的光电性能优值为1.77 × 10-3Ω-1。ZnO/Cu 2/Al 6/ZnO和ZnO/Al 6/Cu 2/ZnO多层膜的可见光透过率和方块电阻基本相同，说明Al和Cu层的沉积顺序对薄膜的光电性能影响不大。表明ZnO/Al/Cu/ZnO多层柔性薄膜具有广阔的应用前景。
ZnO/Al/Cu/ZnO multilayer films were deposited on flexible polyethylene terephthalate (PET) substrates by radio frequency (RF) magnetron sputtering. The overall thickness of the intermediate Al and Cu metal layers maintained at 8 nm. The four different Al/Cu thickness ratios were 7:1, 6:2, 5:3 and 4:4. Other four reference samples were prepared by using the same process, i.e. ZnO single-layer film, ZnO/Al8(8-nm-thick Al layer, the same below)/ZnO, ZnO/Cu8/ZnO and ZnO/Cu2/Al6/ZnO multilayer films. The effects of Al/Cu thickness ratio and deposition sequence of Al and Cu layers were investigated. The results revealed that with the increase of Cu layer thickness, sheet resistance of the multilayer film decreased, while transmittance increased first and then decreased. The ZnO/Al6/Cu2/ZnO multilayer film with a sheet resistance of 108 Ω/sq and an average visible transmittance of 84.73% had the optimum overall photoelectric property, being confirmed by the highest figure of merit of 1.77 × 10–3Ω–1. Furthermore, ZnO/Cu2/Al6/ZnO and ZnO/Al6/Cu2/ZnO multilayer films exhibited almost the same average visible transmittance and sheet resistance, implying that the deposition sequence of Al and Cu layers has little influence on photoelectric properties. It is demonstrated that ZnO/Al/Cu/ZnO multilayer flexible films have great potential in various fields.
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影响因子：
6.9
作者：
L. Zhu;Jikui Luo;G. Shao;W. Milne
通讯作者：
L. Zhu;Jikui Luo;G. Shao;W. Milne
DOI：
10.1007/s00339-017-0794-8
发表时间：
2017-02
期刊：
Applied Physics A
影响因子：
--
作者：
M. Abd-Elrahman;A. A. Abu-sehly-A.;Sherouk Sh. El-sonbaty;M. Hafiz
通讯作者：
M. Abd-Elrahman;A. A. Abu-sehly-A.;Sherouk Sh. El-sonbaty;M. Hafiz
影响因子：
5.2
作者：
Seunghak Shin;Changhun Kim;Jung-A Lee;Y. Heo;Joon-Hyung Lee;Jeong-Joo Kim
通讯作者：
Seunghak Shin;Changhun Kim;Jung-A Lee;Y. Heo;Joon-Hyung Lee;Jeong-Joo Kim
影响因子：
3.2
作者：
M. Hssein;S. Tuo;S. Benayoun;L. Cattin;M. Morsli;Y. Mouchaal;M. Addou;A. Khelil;J. Bernède
通讯作者：
M. Hssein;S. Tuo;S. Benayoun;L. Cattin;M. Morsli;Y. Mouchaal;M. Addou;A. Khelil;J. Bernède
三步法制备超疏水抗反射ZnO纳米棒涂覆FTO透明导电薄膜
影响因子：
6.2
作者：
Li, Bao-jia;Huang, Li-jing;Zhang, Jie-lu
通讯作者：
Zhang, Jie-lu