A Process-Variation-Tolerant Method for Nanophotonic On-Chip Network
A Process-Variation-Tolerant Method for Nanophotonic On-Chip Network
复制标题
纳米光子片上网络的工艺变化容忍方法
DOI:
10.1145/3208073
复制
发表时间:
2018
影响因子:
2.2
通讯作者:
Melhem, Rami
中科院分区:
文献类型:
--
作者:
Xu, Yi;Yang, Jun;Melhem, Rami
Nanophotonic networks, a potential candidate for future networks on-chip, have been challenged for their reliability due to several device-level limitations. One of the main issues is that fabrication errors (a.k.a. process variations) can cause devices to malfunction, rendering communication unreliable. For example, the microring resonator, a preferred optical modulator device, may not resonate at the designated wavelength under process variations (PVs), leading to communication errors and bandwidth loss.This article proposes a series of solutions to the wavelength drifting problem of microrings and subsequent bandwidth loss problem of an optical network, due to PVs. The objective is to maximize network bandwidth through proper arrangement among microrings and wavelengths with minimum power requirements. Our arrangement, called “MinTrim,” solves this problem using simple integer linear programming, adding supplementary microrings, and allowing flexible assignment of wavelengths to network nodes as long as the resulting network presents maximal bandwidth. Each step is shown to improve bandwidth provisioning with lower power requirements. Evaluations on a sample network show that a baseline network could lose more than 40% bandwidth due to PVs. Such loss can be recovered by MinTrim to produce a network with 98.4% working bandwidth. In addition, the power required for arranging microrings is 39% lower than the baseline. Therefore, MinTrim provides an efficient PV-tolerant solution to improving the reliability of on-chip photonics.
登录
查看更多内容
DOI:
--
发表时间:
2012
期刊:
IEEE/OSA Journal of Optical Communications and Networking
影响因子:
--
作者:
Yan Zheng;Peter Lisherness;Ming Gao;J. Bovington;K. Cheng;Hong Wang;Shiyuan Yang
通讯作者:
Shiyuan Yang
DOI:
--
发表时间:
2010
期刊:
OECC 2010 Technical Digest
影响因子:
--
作者:
S. Yoo
通讯作者:
S. Yoo
DOI:
--
发表时间:
2005
期刊:
影响因子:
--
作者:
Y. Nasu;M. Kohtoku;M. Abe;Y. Hibino
通讯作者:
Y. Hibino
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
Danxia Xu
通讯作者:
Danxia Xu
DOI:
--
发表时间:
2003
期刊:
影响因子:
--
作者:
S. Postnikov;S. Hector;C. Garza;Richard D. Peters;V. Ivin
通讯作者:
V. Ivin