Hotspot relaxation time in disordered niobium nitride films
Hotspot relaxation time in disordered niobium nitride films
复制标题
无序氮化铌薄膜中的热点弛豫时间
DOI:
10.1063/1.5124335
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发表时间:
2019-09
影响因子:
4
通讯作者:
Wang Zhen
中科院分区:
文献类型:
--
作者:
Zhang Lu;You Lixing;Yang Xiaoyan;Tang Yan;Si Mengting;Yan Kaixin;Zhang Weijun;Li Hao;Zhou Hui;Peng Wei;Wang Zhen
The hotspot relaxation time (τth) was systematically studied on superconducting nanowire single-photon detectors (SNSPDs) made from ultrathin NbN films with different substrates and chemical compositions. The τth values were measured to be between 9.2 ps
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