Effect of the Fabrication Parameters of the Nanosphere Lithography Method on the Properties of the Deposited Au-Ag Nanoparticle Arrays.
Effect of the Fabrication Parameters of the Nanosphere Lithography Method on the Properties of the Deposited Au-Ag Nanoparticle Arrays.
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纳米球光刻法制备参数对沉积金银纳米颗粒阵列性能的影响
DOI：
10.3390/ma10040381
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发表时间：
2017-04-03
期刊：
影响因子：
--
通讯作者：
Yang CF
中科院分区：
文献类型：
--
作者：
Liu J;Chen C;Yang G;Chen Y;Yang CF
纳米球光刻（NSL）方法可以发展到存款金银三角形六边形纳米颗粒阵列的产生局域表面等离子体共振。以前，我们已经发现，用于形成NSL掩模和所需的物理方法存款的Au-Ag薄膜的参数有很大的影响的纳米颗粒阵列的几何性质。考虑到这一点，不同的参数用于生长Au-Ag三角形六边形纳米颗粒阵列进行了研究。利用自组装纳米尺度的聚苯乙烯（PS）纳米球（平均半径为265 nm）形成单层NSL掩模。首先，将溶液中纳米级PS纳米球的浓度设定为6wt%。两种涂布方法，滴涂和旋涂，用于涂布纳米级PS纳米球作为单层NSL掩模。从扫描电子显微镜（SEM）的观察，我们发现，通过使用滴涂法制备的PS纳米球掩模的基体更均匀，表现出比那些通过旋涂法制备的小的间隙。接下来，使用滴涂法形成单层NSL掩模，并将溶液中的纳米级PS纳米球的浓度从4重量%改变为10重量%，用于进一步研究。SEM照片显示，当PS纳米球的质量分数为6%和8%时，PS纳米球掩模的基体比质量分数为4%和10%时的掩模基体更均匀。研究了基底的单侧提拉角和溶剂的蒸发温度对单层自组装PS纳米球薄膜的影响。最后，将溶液中纳米级PS纳米球的浓度设定为8wt%，以通过滴涂法形成PS纳米球掩模。采用三种不同的物理沉积方法，包括热蒸发、射频磁控溅射和电子枪沉积，制备了存款Au-Ag三角形六角周期纳米颗粒阵列。SEM图像表明，在控制好单层PS纳米球掩模的情况下，热蒸发法可以较好地存款出质量更高的Au-Ag三角六边形纳米颗粒阵列。
The nanosphere lithography (NSL) method can be developed to deposit the Au-Ag triangle hexagonal nanoparticle arrays for the generation of localized surface plasmon resonance. Previously, we have found that the parameters used to form the NSL masks and the physical methods required to deposit the Au-Ag thin films had large effects on the geometry properties of the nanoparticle arrays. Considering this, the different parameters used to grow the Au-Ag triangle hexagonal nanoparticle arrays were investigated. A single-layer NSL mask was formed by using self-assembly nano-scale polystyrene (PS) nanospheres with an average radius of 265 nm. At first, the concentration of the nano-scale PS nanospheres in the solution was set at 6 wt %. Two coating methods, drop-coating and spin-coating, were used to coat the nano-scale PS nanospheres as a single-layer NSL mask. From the observations of scanning electronic microscopy (SEM), we found that the matrixes of the PS nanosphere masks fabricated by using the drop-coating method were more uniform and exhibited a smaller gap than those fabricated by the spin-coating method. Next, the drop-coating method was used to form the single-layer NSL mask and the concentration of nano-scale PS nanospheres in a solution that was changed from 4 to 10 wt %, for further study. The SEM images showed that when the concentrations of PS nanospheres in the solution were 6 and 8 wt %, the matrixes of the PS nanosphere masks were more uniform than those of 4 and 10 wt %. The effects of the one-side lifting angle of substrates and the vaporization temperature for the solvent of one-layer self-assembly PS nanosphere thin films, were also investigated. Finally, the concentration of the nano-scale PS nanospheres in the solution was set at 8 wt % to form the PS nanosphere masks by the drop-coating method. Three different physical deposition methods, including thermal evaporation, radio-frequency magnetron sputtering, and e-gun deposition, were used to deposit the Au-Ag triangle hexagonal periodic nanoparticle arrays. The SEM images showed that as the single-layer PS nanosphere mask was well controlled, the thermal evaporation could deposit the Au-Ag triangle hexagonal nanoparticle arrays with a higher quality than the other two methods.
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影响因子：
15
作者：
Yin, YD;Lu, Y;Xia, YN
通讯作者：
Xia, YN
影响因子：
3.9
作者：
Brolo, AG;Gordon, R;Kavanagh, KL
通讯作者：
Kavanagh, KL
影响因子：
3
作者：
Mishra, Akhilesh K.;Mishra, Satyendra K.;Gupta, Banshi D.
通讯作者：
Gupta, Banshi D.
影响因子：
3.7
作者：
Tabatabaei, Mohammadali;Sangar, Alexandre;Lagugne-Labarthet, Francois
通讯作者：
Lagugne-Labarthet, Francois
影响因子：
3
作者：
Zhu, Shaoli;Fu, Yongqi
通讯作者：
Fu, Yongqi