Optically rough and physically flat TCO substrate formed by coating ZnO thin film on pyramid-patterned glass substrate
Optically rough and physically flat TCO substrate formed by coating ZnO thin film on pyramid-patterned glass substrate
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在金字塔图案玻璃基板上涂覆 ZnO 薄膜形成光学粗糙且物理平坦的 TCO 基板
DOI:
10.1016/j.solmat.2018.11.043
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发表时间:
2019-03
影响因子:
6.9
通讯作者:
Yang T
中科院分区:
文献类型:
--
作者:
Meng L;Chai HY;Yang XG;Lv ZR;Yang T
An optically rough and physically flat (OR-PF) TCO substrate was developed by spin-coating Al-doped ZnO thin film on glass substrate patterned with random pyramidal morphology to enhance the light absorption in superstrate-type thin-film silicon solar cells without deteriorating the growth of photoactive layers. This substrate possesses flat surface with a root mean square roughness of 10.9 nm, high visible light transmittance of over 86%, a sheet resistance of 29.5 Ω/sq, and moderate light-scattering ability. A surface morphology of random pyramidal morphology was formed on the glass substrate by replicating the pyramidal surface texture of a ZnO thin film with the room-temperature nanoimprint technique. Employed as the front electrode of hydrogenated amorphous Si single-junction solar cells, this OR-PF substrate enabled aVocof 0.91 eV, anFFof 0.71, aJscgain of approximately 8%, and an efficiency gain of approximately 20% with respect to the AZO-coated flat glass substrate. TheJscgain is attributed to the enhancement in the light absorption of a-Si:H solar cells triggered by the diffraction behaviour of the interfacial pyramidal morphology, while the achievement of largeVocandFFis ascribed to the improvement in the growth quality of the photoactive layers. Based on the calculation results of the bidirectional scattering distribution function, this substrate empowers comparable intensity of the diffraction peaks for 600–700 nm wavelength light but scatters less light away from the specular direction with respect to the conventional pyramid-textured ZnO substrate. This OR-PF substrate would enable efficient photon management and the growth of high-quality photoactive materials simultaneously for thin-film silicon solar cells.
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影响因子:
22
作者:
Jikun Chen;Hongyi Chen;Feng Hao;Xinyou Ke;N. Chen;T. Yajima;Yong Jiang;Xun Shi;K. Zhou;M. Döbeli;Tiansong Zhang;B. Ge;Hongliang Dong;H. Zeng;Wenwang Wu;Lidong Chen
通讯作者:
Jikun Chen;Hongyi Chen;Feng Hao;Xinyou Ke;N. Chen;T. Yajima;Yong Jiang;Xun Shi;K. Zhou;M. Döbeli;Tiansong Zhang;B. Ge;Hongliang Dong;H. Zeng;Wenwang Wu;Lidong Chen
影响因子:
15
作者:
Ong, Beng S.;Li, Chensha;Loutfy, Rafik
通讯作者:
Loutfy, Rafik
影响因子:
6.9
作者:
L. Meng;S. Miyajima
通讯作者:
L. Meng;S. Miyajima
DOI:
10.1142/9781786344496_0009
发表时间:
2002
期刊:
--
影响因子:
--
作者:
A. Pudov;J. Sites;T. Nakada
通讯作者:
A. Pudov;J. Sites;T. Nakada
影响因子:
3.2
作者:
A. Čampa;J. Krč;M. Topič
通讯作者:
A. Čampa;J. Krč;M. Topič